Epitaxial MOCVD of Thin Film Ceramics for Pyroelectric Detectors

Award Information
Agency: Department of Defense
Branch: Army
Contract: N/A
Agency Tracking Number: 20670
Amount: $49,940.00
Phase: Phase I
Program: SBIR
Awards Year: 1993
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
Spire Corp.
One Patriots Park, Bedford, MA, 01730
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Anton C. Greenwald, Ph.d.
 (617) 275-6000
Business Contact
Phone: () -
Research Institution
N/A
Abstract
Spire proposes to deposit very thin films of lead-titanate by Metal Organic Chemical Vapor Deposition (MOCVD) for use as pyroelectric detectors. A multilayer structure will be fabricated to create an epitaxial, thermally isolated detector element with higher sensitivity than that of the thick films presently being used. MOCVD is an innovative technique which allows sequential heteroepitaxial growth of electrical and thermal insulators, electrically conducting layers, and pyroelectric materials. In Phase I, Spire will use its unique capabilities to deposit (metal)/PbTiO3/CoSi2 on silicon and will measure lead titanate's pyroelectric coefficient. Prototype infrared sensors with integrated FET's would be fabricated in Phase II. Integrated pyroelectric detector arrays made possible by this technology would have greater sensitivity and resolution arrays produced by existing hybrid fabrication processes.

* information listed above is at the time of submission.

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