Advanced UHV System for Producing High Performance Silicon Based Photoemmisive Infrared Sensors

Award Information
Agency:
Department of Defense
Branch
Air Force
Amount:
$79,924.00
Award Year:
1995
Program:
SBIR
Phase:
Phase I
Contract:
n/a
Award Id:
27976
Agency Tracking Number:
27976
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
7620 Executive Drive, Eden Prairie, MN, 55344
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
P.p. Chow
(612) 941-1898
Business Contact:
() -
Research Institute:
n/a
Abstract
An advance ultra-high vacuum (UHV) deposition system will be designed for fabrication of group IV photoemissive materials for high performance long wavelength infrared (8-12 um) focal plane applications. Device candidates including silicides, and silicon germanium superlattices and quantum wells, will be considered from the material growth perspective. Various steps of the fabrication process will be examined. The system design will address critical issues for the fabrication of these device structures. The new system will achieve a base pressure of 5E-11 Torr, be capable of reproducible atomic layer control of thickness, composition, and growth temperature, and attain a very high doping level (e.g. boron P+-spike). The system will be versatile and flexible to accommodate differences in the fabrication requirements of various devices. In situ sensing and computer control will be incorporated into the system design, and surface preparation and flex control techniques will also be evaluated. The optimized system design will be implemented in Phase II. Such a system will be suitable for low cost production of high performance DOD and commercial SiGe electronics as well.

* information listed above is at the time of submission.

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