Low Pressure Source for Mass-Selective, Diffusion Assisted Epitaxy

Award Information
Agency:
Department of Defense
Branch
Air Force
Amount:
$499,999.00
Award Year:
2004
Program:
STTR
Phase:
Phase II
Contract:
FA9550-04-C-0051
Award Id:
56061
Agency Tracking Number:
F023-0193
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
7620 Executive Drive, Eden Prairie, MN, 55344
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
876868647
Principal Investigator:
Amir Dabiran
MBE Lab Manager
(952) 934-2100
dabiran@svta.com
Business Contact:
Scott Vandel
Contract Administrator
(952) 934-2100
vandel@svta.com
Research Institute:
University of Minnesota
Philip I Cohen
Dept of Elec. & Comp Eng., 200 Union Street S.E.
Minneapolis, MN, 55455
(612) 625-5517
Nonprofit college or university
Abstract
Epitaxial growth of non-equilibrium thin-film structures, which have high quality and abrupt interfaces, is still the main challenge that limits many material systems for applications in semiconductor devices. In this STTR Phase II program, SVT Associates (SVTA) in collaboration with the University of Minnesota (UMN) will develop a new RF plasma light-mass ion source, compatible with the low-pressure requirements of molecular beam epitaxy (MBE). This source will allow selective enhancement of the motion of surface atoms during thin film growth. Ion-enhanced MBE growth techniques will be used at SVTA and UMN to achieve high-quality growth of challenging material systems such as high-indium-content III-nitride films and novel high-temperature oxides. These are technologically important materials with broad applications in high frequency and high-power electronics, UV photodetectors and emitters, and MEMs and high-temperature device packaging.

* information listed above is at the time of submission.

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