DEVELOPMENT OF KNO(3) FERROELECTRIC MEMORIES

Award Information
Agency:
Department of Defense
Branch
Navy
Amount:
$500,000.00
Award Year:
1988
Program:
SBIR
Phase:
Phase II
Contract:
n/a
Agency Tracking Number:
6510
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
Symetrix Corp.
215 E Sunbrid Cliffs Ln, Colorado Springs, CO, 80907
Hubzone Owned:
N
Socially and Economically Disadvantaged:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
Robert Venes
(303) 594-4455
Business Contact:
() -
Research Institution:
n/a
Abstract
WE HAVE FABRICATED POTASSIUM NITRATE FERROELECTRIC MEMORIES IN THE FORM OF 32 X 32 CELL ARRAYS ON GLASS SUBSTRATES (1KB) AND MEASURED THEIR SWITCHING TIMES AND READ WRITE CHARACTERISTICS. THE THINNEST KNO(3) FILMS TESTED (75NM) YIELD 20 NS READ-WRITE TIMES AND HIGH BREAKDOWN VOLTAGES (17V). MINIMUM ADDRESS VOLTAGES OF 1.6V ARE ACHIEVED AT 150 NM THICKNESS. A THICKNESS WINDOW FROM 65 TO 800 NM IS COMPATIBLE WITH 4.5V STANDARD SILICON LOGIC LEVELS (TTL-CMOS). NEUTRON HARDNESS TO 5 X 10 TO THE 13TH POWER HAS BEEN MEASURED FORM SOME FILMS. WE WILL FABRICATE A NUMBER OF 1KB ARRAYS AND STUD THE PROCESSING PARAMETERS THAT INFLUENCE FATIGUE LIMITS. WE HAVE RECENTRLY DISCOVERED THAT A SINGLE 10V "RESTORE" PULSE RETURNS THE KNO(3) MEMORIES TO A STATE VERY NEAR THAT OF VIRGIN DEVICES. RELATED ELECTRICAL REMEDIES FOR FATIGUE/ENDURE PROBLEMS WILL BE ANALYZED UNDER THE PROPOSED WORK, TOGETHER WITH CHEMICAL APPROACHES INVOLVING DOPANTS.

* information listed above is at the time of submission.

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