Low Cost Nanolithography Techniques Using Elastomer Shrinkage and/or Plasmon Confinement
Department of Defense
Defense Advanced Research Projects Agency
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Small Business Information
TANNER RESEARCH, INC.
2650 East Foothill Boulevard, Pasadena, CA, 91107
Socially and Economically Disadvantaged:
AbstractNanolithography remains the critical hurdle in developing and commercializing new nanotechnology devices. A low cost nanolithography technique must be developed if the promise of nanotechnology is to be fully realized. Tanner Research and Stanford University are proposing two new nanolithography techniques based on elastomer shrinkage and plasmon confinement. Both of these techniques will be pursued in parallel during Phase I wherein we will demonstrate the proof of concept for lithography at 35-40 nm feature sizes, mitigate the associated risk areas, and develop specific applications for the two techniques.
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