Low Cost Nanolithography Techniques Using Elastomer Shrinkage and/or Plasmon Confinement

Award Information
Agency:
Department of Defense
Amount:
$98,990.00
Program:
SBIR
Contract:
W31P4Q-05-C-R068
Solitcitation Year:
2004
Solicitation Number:
2004.3
Branch:
Defense Advanced Research Projects Agency
Award Year:
2004
Phase:
Phase I
Agency Tracking Number:
04SB3-0248
Solicitation Topic Code:
SB043-045
Small Business Information
TANNER RESEARCH, INC.
2650 East Foothill Boulevard, Pasadena, CA, 91107
Hubzone Owned:
N
Woman Owned:
N
Socially and Economically Disadvantaged:
N
Duns:
195754056
Principal Investigator
 Ravi Verma
 Scientist
 (626) 792-3000
 ravi.verma@tanner.com
Business Contact
 Kevin Dinniene
Title: Controller
Phone: (626) 792-3000
Email: kevin@tanner.com
Research Institution
N/A
Abstract
Nanolithography remains the critical hurdle in developing and commercializing new nanotechnology devices. A low cost nanolithography technique must be developed if the promise of nanotechnology is to be fully realized. Tanner Research and Stanford University are proposing two new nanolithography techniques based on elastomer shrinkage and plasmon confinement. Both of these techniques will be pursued in parallel during Phase I wherein we will demonstrate the proof of concept for lithography at 35-40 nm feature sizes, mitigate the associated risk areas, and develop specific applications for the two techniques.

* information listed above is at the time of submission.

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