Low Cost Nanolithography Techniques Using Elastomer Shrinkage and/or Plasmon Confinement

Award Information
Agency:
Department of Defense
Branch
Defense Advanced Research Projects Agency
Amount:
$98,990.00
Award Year:
2004
Program:
SBIR
Phase:
Phase I
Contract:
W31P4Q-05-C-R068
Award Id:
68865
Agency Tracking Number:
04SB3-0248
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
2650 East Foothill Boulevard, Pasadena, CA, 91107
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
195754056
Principal Investigator:
Ravi Verma
Scientist
(626) 792-3000
ravi.verma@tanner.com
Business Contact:
Kevin Dinniene
Controller
(626) 792-3000
kevin@tanner.com
Research Institution:
n/a
Abstract
Nanolithography remains the critical hurdle in developing and commercializing new nanotechnology devices. A low cost nanolithography technique must be developed if the promise of nanotechnology is to be fully realized. Tanner Research and Stanford University are proposing two new nanolithography techniques based on elastomer shrinkage and plasmon confinement. Both of these techniques will be pursued in parallel during Phase I wherein we will demonstrate the proof of concept for lithography at 35-40 nm feature sizes, mitigate the associated risk areas, and develop specific applications for the two techniques.

* information listed above is at the time of submission.

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