Vacuum-assisted MIMIC for EMI grid application on spinel domes

Award Information
Agency:
Department of Defense
Branch
Army
Amount:
$69,983.00
Award Year:
2008
Program:
SBIR
Phase:
Phase I
Contract:
W31P4Q-09-C-0086
Award Id:
87116
Agency Tracking Number:
A082-035-1395
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
133 Defense Highway, Suite 212, Annapolis, MD, 21401
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
153908801
Principal Investigator:
Todd Heil
Research Scientist/Engineer
(410) 987-8988
tmheil@techassess.com
Business Contact:
Sharon Fehrenbacher
CEO
(410) 224-3710
sharon@techassess.com
Research Institution:
n/a
Abstract
Soft lithography is an inexpensive and fast method for applying micropatterned structures to both flat and nonplanar substrates. A vacuum-assisted Micromolding in Capillaries (MIMIC) technique will be developed to print a fine electromagnetic interference (EMI) grid on the inner surface of transparent spinel domes. A photocurable silver filled resin will infiltrate an EMI grid channel patterned on the surface of an elastomeric stamp using vacuum-assisted MIMIC. After exposure to ultraviolet light, the silver resin will cure and then be subjected to furnace treatments to burn off the polymer and densify the silver grid. After densification, the EMI grid will have a low sheet resistance obtained by tailoring the thickness of the gridlines. It is anticipated that this process will significantly reduce the cost of EMI grid application on transparent spinel domes.

* information listed above is at the time of submission.

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