Conformal Metal Grid Patterning for Green Spinel Domes

Award Information
Agency:
Department of Defense
Branch
Army
Amount:
$69,943.00
Award Year:
2009
Program:
SBIR
Phase:
Phase I
Contract:
W31P4Q-09-C-0565
Award Id:
92095
Agency Tracking Number:
A091-008-0194
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
133 Defense Highway, Suite 212, Annapolis, MD, 21401
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
153908801
Principal Investigator:
Greg Slavik
Research Scientist
(410) 987-8988
gslavik@techassess.com
Business Contact:
Sharon Fehrenbacher
CEO
(410) 224-3710
sharon@techassess.com
Research Institution:
n/a
Abstract
Soft lithography is an inexpensive and fast method for applying micropatterned structures to both flat and nonplanar substrates. TA&T leverages multiple soft lithographic processing steps to pattern co-fireable refractory metal grid on spinel dome windows for electromagnetic interference (EMI) filtering purposes. In addition to the overall curvature of a green ceramic dome, the surface roughness poses difficulties that preclude many other techniques for applying high fidelity features to a surface. The proposed approach overcomes the technical issues by forming the conductive material grid pattern on a transfer film that can be integrated into the ceramic production process. A micromolding technique which infiltrates a photocurable resin formulated with metal loading into channels which define the grid dimensions is developed to pattern on the film. The complete system of inorganics and organics necessary for the gridding and transparent ceramic production is considered for compatibility. The resulting grid is expected to have low sheet resistance for high EMI shielding performance.

* information listed above is at the time of submission.

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