Conformal Metal Grid Patterning for Green Spinel Domes

Award Information
Agency:
Department of Defense
Amount:
$69,943.00
Program:
SBIR
Contract:
W31P4Q-09-C-0565
Solitcitation Year:
2009
Solicitation Number:
2009.1
Branch:
Army
Award Year:
2009
Phase:
Phase I
Agency Tracking Number:
A091-008-0194
Solicitation Topic Code:
A09-008
Small Business Information
Technology Assessment & Transfer, Inc.
133 Defense Highway, Suite 212, Annapolis, MD, 21401
Hubzone Owned:
N
Woman Owned:
Y
Socially and Economically Disadvantaged:
N
Duns:
153908801
Principal Investigator
 Greg Slavik
 Research Scientist
 (410) 987-8988
 gslavik@techassess.com
Business Contact
 Sharon Fehrenbacher
Title: CEO
Phone: (410) 224-3710
Email: sharon@techassess.com
Research Institution
N/A
Abstract
Soft lithography is an inexpensive and fast method for applying micropatterned structures to both flat and nonplanar substrates. TA&T leverages multiple soft lithographic processing steps to pattern co-fireable refractory metal grid on spinel dome windows for electromagnetic interference (EMI) filtering purposes. In addition to the overall curvature of a green ceramic dome, the surface roughness poses difficulties that preclude many other techniques for applying high fidelity features to a surface. The proposed approach overcomes the technical issues by forming the conductive material grid pattern on a transfer film that can be integrated into the ceramic production process. A micromolding technique which infiltrates a photocurable resin formulated with metal loading into channels which define the grid dimensions is developed to pattern on the film. The complete system of inorganics and organics necessary for the gridding and transparent ceramic production is considered for compatibility. The resulting grid is expected to have low sheet resistance for high EMI shielding performance.

* information listed above is at the time of submission.

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