Expedited Fabrication of Conformal Window for ABL

Award Information
Agency:
Department of Defense
Amount:
$749,999.00
Program:
SBIR
Contract:
W9113M-06-C-0173
Solitcitation Year:
2004
Solicitation Number:
2004.4
Branch:
Missile Defense Agency
Award Year:
2006
Phase:
Phase II
Agency Tracking Number:
044-1200
Solicitation Topic Code:
MDA04-107
Small Business Information
THIRD WAVE SYSTEMS, INC.
7900 West 78th St. Suite 250, Minneapolis, MN, 55439
Hubzone Owned:
N
Woman Owned:
N
Socially and Economically Disadvantaged:
N
Duns:
938966090
Principal Investigator
 Troy Marusich
 Chief Technical Officer
 (952) 832-5515
 troym@thirdwavesys.com
Business Contact
 Kerry Marusich
Title: President, CEO
Phone: (952) 832-5515
Email: sales@thirdwavesys.com
Research Institution
N/A
Abstract
The manufacture of meter-class windows and mirrors requires extended fabrication periods, often longer than one year. This is because current fabrication techniques entail multiple stages of grinding, lapping, and polishing to achieve high surface finish and dimensional requirements. Our Phase II project will demonstrate innovative ductile mode machining (DMM) process and modeling technology the MDA needs for fast, affordable, high quality meter-class windows and mirrors for the ABL. Our innovative program will: (a) Reduce fabrication times by 50% via reduction/elimination of grinding, lapping and polishing; (b) Achieve higher part quality, (10–50 nanometer RMS surface roughness); (c) Virtually eliminate surface and subsurface flaws; (d) Predict beneficial DMM conditions; and (d) Reduce cost of windows and mirrors. DMM is the key technology, supported by advanced process modeling, which we will use with universities and conformal window fabricator Brashear to demonstrate the proposed production-level benefits for windows and mirrors. Our three-phased disciplined development program will: (a) Complete technology development for production-level DMM; (b) Fabricate a scaled prototype window using DMM; (c) Determine production-level process conditions for SiC mirrors and fabricate via DMM.

* information listed above is at the time of submission.

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