FOCUSED ION IMPLANTATION FOR OPTOELECTRONIC CIRCUITS

Award Information
Agency:
Department of Defense
Branch
Navy
Amount:
$500,000.00
Award Year:
1991
Program:
SBIR
Phase:
Phase II
Contract:
n/a
Agency Tracking Number:
13105
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
Universal Energy Systems Inc.
4401 Dayton-xenia Rd, Dayton, OH, 45432
Hubzone Owned:
N
Socially and Economically Disadvantaged:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
Peter P Pronko
(513) 426-6900
Business Contact:
() -
Research Institution:
n/a
Abstract
THE INTENT OF THIS PROGRAM IS TO DEVELOP, TEST, AND EVALUATE THE USE OF FOCUSED ION BEAMS FOR THE PURPOSE OF FABRICATING, THROUGH IN SITU MATERIALS MODIFICATION, THE NECESSARY DIMENSIONAL ELEMENTS FOUND IN OPTOELECTRONIC CIRCUITS. SUCH ELEMENTS WOULD CONSIST OF MONOLITHICALLY INTEGRATED SOLID STATE SOURCE LASERS, OPTICAL SIGNAL HANDLING ELEMENTS SUCH AS BEAM SPLITTERS, COUPLERS, AND WAVEGUIDES, AS WELL AS OPTOELECTRONIC DETECTOR ELEMENTS. FOCUSED ION BEAMS USED DIRECTLY, OR IN THE PRESENCE OF REACTIVE GASES AND IN COMBINATION WITH OTHER PLANAR DEPOSITION TECHNIQUES HAVE THE POTENTIAL FOR SIGNIFICANT ADVANCES IN THE PROCESSING AND FABRICATION TECHNOLOGY OF OPTOELECTRONIC CIRCUITS THROUGH THE PRECISE BEAM WRITING CAPABILITIES THAT IT REPRESENTS.

* information listed above is at the time of submission.

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