Voltaix, Inc

Company Information

Company Name
Voltaix, Inc
Address
197 Meister Avenue
North Branch, NJ, 08876-1303
Phone
1 908-231-9060
URL
n/a
DUNS
173293994
Number of Employees
65
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N

Award Totals

PROGRAM/PHASE
AWARD AMOUNT ($)
NUMBER OF AWARDS
SBIR Phase I
$99,970.00
2
STTR Phase I
$98,596.00
1
STTR Phase II
$498,909.00
1
Chart code to be here

Award List

  1. EXPERIMENTAL EVALUATION OF THE SYNTHETIC SOLID ELECTROLYTE INTERFACE CONCEPT FOR THE PRIMARY CA-SOCL2 BATTERY SYSTEM

    Amount: $49,970.00

    THE CA-SOCL(2) BATTERY CHEMISTRY IS AN EXCELLANT CANDIDATE TO PROVIDE SAFE OPERATION IN BATTERIES SIGNIFICIANTLY LARGER THAN 1 KG OPERATE AT STEADY RATES GREATER THAN THE "C" RATE IN ARMY APPLICATIONS ...

    SBIR Phase I 1988 ArmyDepartment of Defense
  2. PRECURSORS FOR ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION OF COMPOUND SEMICONDUCTORS

    Amount: $50,000.00

    THE CHEMICAL VAPOR DEPOSITION OF COMPOUND SEMICONDUCTORS REQUIRES VOLATILE PRECURSOR MOLECULES, USUALLY ORGANOMETALLIC (OM) LIQUIDS OR METAL HYDRIDE (MH) GASES, WHICH CAN BE THERMALLY DECOMPOSED ON A ...

    SBIR Phase I 1989 Defense Advanced Research Projects AgencyDepartment of Defense
  3. STTR Phase I: Germyl Silanes- Enabling Precursors for Chemical Vapor Deposition of Advanced CMOS Substrates, CMOS-Integrated MEMS, and Nano-Scale Quantum-Dot Silicon Photonics

    Amount: $98,596.00

    This Small Business Technology Transfer (STTR) Phase I project constitutes the first step in the commercialization of an innovation in the manufacture of advanced complementary metal oxide (CMOS) semi ...

    STTR Phase I 2006 National Science Foundation
  4. STTR Phase II: Germyl Silanes- Enabling Precursors for Chemical Vapor Deposition of Advanced CMOS Substrates, CMOS-Integrated MEMS, and Nano-Scale Quantum-Dot Silicon Phot

    Amount: $498,909.00

    This Small Business Technology Transfer Phase II project will demonstrate pilot scale manufacture of germyl silane precursors and their use to create prototype semiconductor devices and thin films und ...

    STTR Phase II 2008 National Science Foundation

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