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Dual-Probe CD-AFM Calibration

Award Information
Agency: Department of Commerce
Branch: National Institute of Standards and Technology
Contract: N/A
Agency Tracking Number: 219-58
Amount: $300,000.00
Phase: Phase II
Program: SBIR
Solicitation Topic Code: N/A
Solicitation Number: N/A
Timeline
Solicitation Year: N/A
Award Year: 2004
Award Start Date (Proposal Award Date): N/A
Award End Date (Contract End Date): N/A
Small Business Information
8906 Wall Street, Suite 105, Austin, TX, 78754
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Vladimir Mancevski
 (512) 339-0608
 vam@xidex.com
Business Contact
Phone: () -
Research Institution
N/A
Abstract
Xidex proposes to demonstrate the feasibility of calibrating a critical-dimension atomic force microscope (CD-AFM) without the use of a reference artifact in such a way that high-precision critical dimensions can be generated independently of changes in probe tip shape. We plan to demonstrate sub-nanometer repeatability for tip-to-tip calibration, and demonstrate single-point critical-dimension measurements which verify that tip-to-tip calibration removes the effects of tip shape variation and tip wear from linewidth measurements. Phase 2 will provide critical design guidance for controller design and MEMS fabrication of probes and tips for use with a commercial dual-probe system. These are our next critical steps on the path to the commercial NanoCaliperTM CD-AFM tool we are developing. COMMERCIAL APPLICATIONS: Xidex Corporation is in the business of developing, and bringing to market critical-dimension (CD) metrology equipment for use by major semiconductor chip manufacturers. Our product, NanoCaliperTM Critical-Dimension Atomic Force Microscope (CD-AFM), based on our proprietary dual-probe AFM technology, is positioned to capture the lead in the CD metrology equipment market at a time when the semiconductor industry is seeking a transition from mature scanning electron microscope (SEM) technology to its next-generation measuring technology. This kind of industry-wide transition in the dominant measurement technology comes along only once every 10-15 years. Xidex proposes to demonstrate the feasibility of calibrating a critical-dimension atomic force microscope (CD-AFM) without the use of a reference artifact in such a way that high-precision critical dimensions can be generated independently of changes in probe tip shape. We plan to demonstrate sub-nanometer repeatability for tip-to-tip calibration, and demonstrate single-point critical-dimension measurements which verify that tip-to-tip calibration removes the effects of tip shape variation and tip wear from linewidth measurements. Phase 2 will provide critical design guidance for controller design and MEMS fabrication of probes and tips for use with a commercial dual-probe system. These are our next critical steps on the path to the commercial NanoCaliperTM CD-AFM tool we are developing. COMMERCIAL APPLICATIONS: Xidex Corporation is in the business of developing, and bringing to market critical-dimension (CD) metrology equipment for use by major semiconductor chip manufacturers. Our product, NanoCaliperTM Critical-Dimension Atomic Force Microscope (CD-AFM), based on our proprietary dual-probe AFM technology, is positioned to capture the lead in the CD metrology equipment market at a time when the semiconductor industry is seeking a transition from mature scanning electron microscope (SEM) technology to its next-generation measuring technology. This kind of industry-wide transition in the dominant measurement technology comes along only once every 10-15 years. Xidex proposes to demonstrate the feasibility of calibrating a critical-dimension atomic force microscope (CD-AFM) without the use of a reference artifact in such a way that high-precision critical dimensions can be generated independently of changes in probe tip shape. We plan to demonstrate sub-nanometer repeatability for tip-to-tip calibration, and demonstrate single-point critical-dimension measurements which verify that tip-to-tip calibration removes the effects of tip shape variation and tip wear from linewidth measurements. Phase 2 will provide critical design guidance for controller design and MEMS fabrication of probes and tips for use with a commercial dual-probe system. These are our next critical steps on the path to the commercial NanoCaliperTM CD-AFM tool we are developing. COMMERCIAL APPLICATIONS: Xidex Corporation is in the business of developing, and bringing to market critical-dimension (CD) metrology equipment for use by major semiconductor chip manufacturers. Our product, NanoCaliperTM Critical-Dimension Atomic Force Microscope (CD-AFM), based on our proprietary dual-probe AFM technology, is positioned to capture the lead in the CD metrology equipment market at a time when the semiconductor industry is seeking a transition from mature scanning electron microscope (SEM) technology to its next-generation measuring technology. This kind of industry-wide transition in the dominant measurement technology comes along only once every 10-15 years. Xidex proposes to demonstrate the feasibility of calibrating a critical-dimension atomic force microscope (CD-AFM) without the use of a reference artifact in such a way that high-precision critical dimensions can be generated independently of changes in probe tip shape. We plan to demonstrate sub-nanometer repeatability for tip-to-tip calibration, and demonstrate single-point critical-dimension measurements which verify that tip-to-tip calibration removes the effects of tip shape variation and tip wear from linewidth measurements. Phase 2 will provide critical design guidance for controller design and MEMS fabrication of probes and tips for use with a commercial dual-probe system. These are our next critical steps on the path to the commercial NanoCaliperTM CD-AFM tool we are developing. COMMERCIAL APPLICATIONS: Xidex Corporation is in the business of developing, and bringing to market critical-dimension (CD) metrology equipment for use by major semiconductor chip manufacturers. Our product, NanoCaliperTM Critical-Dimension Atomic Force Microscope (CD-AFM), based on our proprietary dual-probe AFM technology, is positioned to capture the lead in the CD metrology equipment market at a time when the semiconductor industry is seeking a transition from mature scanning electron microscope (SEM) technology to its next-generation measuring technology. This kind of industry-wide transition in the dominant measurement technology comes along only once every 10-15 years. Xidex proposes to demonstrate the feasibility of calibrating a critical-dimension atomic force microscope (CD-AFM) without the use of a reference artifact in such a way that high-precision critical dimensions can be generated independently of changes in probe tip shape. We plan to demonstrate sub-nanometer repeatability for tip-to-tip calibration, and demonstrate single-point critical-dimension measurements which verify that tip-to-tip calibration removes the effects of tip shape variation and tip wear from linewidth measurements. Phase 2 will provide critical design guidance for controller design and MEMS fabrication of probes and tips for use with a commercial dual-probe system. These are our next critical steps on the path to the commercial NanoCaliperTM CD-AFM tool we are developing. COMMERCIAL APPLICATIONS: Xidex Corporation is in the business of developing, and bringing to market critical-dimension (CD) metrology equipment for use by major semiconductor chip manufacturers. Our product, NanoCaliperTM Critical-Dimension Atomic Force Microscope (CD-AFM), based on our proprietary dual-probe AFM technology, is positioned to capture the lead in the CD metrology equipment market at a time when the semiconductor industry is seeking a transition from mature scanning electron microscope (SEM) technology to its next-generation measuring technology. This kind of industry-wide transition in the dominant measurement technology comes along only once every 10-15 years. Xidex proposes to demonstrate the feasibility of calibrating a critical-dimension atomic force microscope (CD-AFM) without the use of a reference artifact in such a way that high-precision critical dimensions can be generated independently of changes in probe tip shape. We plan to demonstrate sub-nanometer repeatability for tip-to-tip calibration, and demonstrate single-point critical-dimension measurements which verify that tip-to-tip calibration removes the effects of tip shape variation and tip wear from linewidth measurements. Phase 2 will provide critical design guidance for controller design and MEMS fabrication of probes and tips for use with a commercial dual-probe system. These are our next critical steps on the path to the commercial NanoCaliperTM CD-AFM tool we are developing. COMMERCIAL APPLICATIONS: Xidex Corporation is in the business of developing, and bringing to market critical-dimension (CD) metrology equipment for use by major semiconductor chip manufacturers. Our product, NanoCaliperTM Critical-Dimension Atomic Force Microscope (CD-AFM), based on our proprietary dual-probe AFM technology, is positioned to capture the lead in the CD metrology equipment market at a time when the semiconductor industry is seeking a transition from mature scanning electron microscope (SEM) technology to its next-generation measuring technology. This kind of industry-wide transition in the dominant measurement technology comes along only once every 10-15 years.

* Information listed above is at the time of submission. *

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