POSS-Based Conformal Coating with Active Tin Whisker Mitigation Properties

Award Information
Agency: Department of Defense
Branch: Missile Defense Agency
Contract: W9113M-08-C-0065
Agency Tracking Number: B073-027-0321
Amount: $100,000.00
Phase: Phase I
Program: SBIR
Awards Year: 2008
Solicitation Year: 2007
Solicitation Topic Code: MDA07-027
Solicitation Number: 2007.3
Small Business Information
VISTA ENGINEERING & CONSULTING, LLC
1500 1st Ave. No, Suite B117, Birmingham, AL, 35203
DUNS: 605513048
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 John Cassimus
 Metallurgical Engineer
 (205) 307-6550
 jcassimus@vistaeng.com
Business Contact
 Raymond Thompson
Title: Manager
Phone: (205) 307-6550
Email: rthompson@vistaeng.com
Research Institution
N/A
Abstract
It is proposed that a Phase I SBIR be conducted to evaluate the feasibility of developing a POSS-based (Polyhedral Oligomeric Silsesquioxanes) coating that performs the multifunctional needs of a conformal coating that actively mitigates tin whisker growth. New conformal coating materials are needed to mitigate the risk of tin whisker caused short circuits on electronic assemblies. Development of a new conformal coating that successfully prevents tin whisker penetration would greatly reduce the risk of tin whisker induced failure over the service life of a military system. POSS, with its nano-SiO molecular structure, has unique properties as a coating that make it environmentally stable, an excellent moisture barrier, and nonvolatile. These unique properties of the POSS feed stock present an unusual opportunity to the electronics industry; a conformal coating that also actively mitigates tin whisker nucleation and growth through chemical interaction with the tin oxide surface. Vista Engineering, working with a Hybrid Plastics’ patented formulation will test a group of the POSS derivatives and application variables during Phase I and select a set of promising POSS formulations for Phase II development.

* information listed above is at the time of submission.

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