Massive Arrays of Monodisperse Nanosized Catalyst Particles and Monodisperse High Aspect-Ratio Vertically Aligned Multi-Walled Carbon Nanotube Technol

Award Information
Agency:
Department of Defense
Branch
Office of the Secretary of Defense
Amount:
$99,998.00
Award Year:
2011
Program:
STTR
Phase:
Phase I
Contract:
N00014-11-M-0193
Award Id:
n/a
Agency Tracking Number:
O10B-004-4011
Solicitation Year:
2010
Solicitation Topic Code:
OSD10-T004
Solicitation Number:
2010.B
Small Business Information
MA, Natick, MA, 01760-1023
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
184629491
Principal Investigator:
Luis Velasquez-Garcia
Principal Scientist
(617) 253-0573
lfvelasq@mit.edu
Business Contact:
Judy Budny
Contracts Administrator
(508) 655-5565
judy@busek.com
Research Institution:
Massachusetts Institute of Tech
Kimberly Mann
77 Massachusetts Avenue
Cambridge, MA, 02139-
(617) 253-3907
Domestic nonprofit research organization
Abstract
Busek and MIT propose to explore techniques for enhanced control of nickel catalyst pad size and distribution (pitch) for growth of massive arrays of isolated multiwalled carbon nanotubes (MWNTs) at spacing as small as 10nm. The two catalyst application approaches shall be electron beam lithography and nanosphere lithography, and the MWNT growth shall be accomplished by plasma enhanced chemical vapor deposition (PECVD), the preferred method for MWNTs of uniform length and diameter. Two different types of PECVD reactors shall be used: a commercially-available CNT growth furnace at MIT, and the Busek-developed inductively-heated PECVD reactor capable of MWNT deposition on curved surfaces. Both catalyst pattern characteristics as well as MWNT morphology shall be measured via SEM. Ultracapacitor applications shall be explored, where resultant MWNT samples shall be coated using physical vapor deposition (PVD) and PECVD processes applying dielectric conformal coat and a metal coat. Capacitance of the various samples shall be measured. The Phase I efforts shall set the stage for Phase II development of advanced deposition techniques, larger-area capacitors, and long-length MWNTs.

* information listed above is at the time of submission.

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