Roll to Roll Nanoimprinting

Award Information
Agency:
Department of Defense
Branch
Office of the Secretary of Defense
Amount:
$100,000.00
Award Year:
2011
Program:
STTR
Phase:
Phase I
Contract:
FA9550-11-C-0046
Award Id:
n/a
Agency Tracking Number:
O10B-005-1009
Solicitation Year:
2010
Solicitation Topic Code:
OSD10-T005
Solicitation Number:
2010.B
Small Business Information
1807-C West Braker Lane, Suite 100, Austin, TX, 78758-
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
039398891
Principal Investigator:
Jin Choi
Director for Advanced Technology
(512) 334-7760
jin@molecularimprints.com
Business Contact:
Adam Feinstein
Product Marketing Engineer
(512) 334-1208
afeinstein@molecularimprints.com
Research Institution:
University of Texas at Austin
Edward Yu
Microelectronics Research Cent
10100 Burnet Rd., Bldg. 160
Austin, TX, 78758-
(512) 232-5167
Nonprofit college or university
Abstract
In this phase 1 STTR, a roll-to-roll (R2R), high throughput nanoimprint lithography system and process prototype will be developed based on Molecular Imprints Inc."s Jet and Flash Imprint Lithography (J-FIL) technology. The R2R system will incorporate resist ink jetting with web tension control to achieve sub-50nm lithography and the following key process attributes: (i) Thin and uniform residual layer control with a target sub-15nm (mean) and sub-2nm (sigma); (ii) High aspect ratio patterns (>3:1 ratio) at 50nm resolution with arbitrary complexity; (iii) High throughput with target of>5m/min; and (iv) low resist material usage (~50-150 micro-liters/m2). The resulting process will allow pattern transfer into dielectrics and metal films with control in pattern size and complexity; and the cost structure will be attractive even for commodity applications such as thin-film solar cells. This process could be applied to applications such as large area sub-wavelength photonics devices, displays, and solar cells. We will focus on plasmonic nanostructures for thin-film solar cells based on amorphous silicon. We will perform simulation studies to obtain optimal plasmonic structures for maximizing absorption at long wavelengths over a broad band. We will then demonstrate fabrication (including pattern transfer) of these representative plasmonic patterns in appropriate film stacks.

* information listed above is at the time of submission.

Agency Micro-sites


SBA logo

Department of Agriculture logo

Department of Commerce logo

Department of Defense logo

Department of Education logo

Department of Energy logo

Department of Health and Human Services logo

Department of Homeland Security logo

Department of Transportation logo

Enviromental Protection Agency logo

National Aeronautics and Space Administration logo

National Science Foundation logo
US Flag An Official Website of the United States Government