Roll to Roll Nanoimprinting

Award Information
Agency: Department of Defense
Branch: Air Force
Contract: FA9550-11-C-0046
Agency Tracking Number: O10B-005-1009
Amount: $100,000.00
Phase: Phase I
Program: STTR
Awards Year: 2011
Solitcitation Year: 2010
Solitcitation Topic Code: OSD10-T005
Solitcitation Number: 2010.B
Small Business Information
Molecular Imprints, Inc.
1807-C West Braker Lane, Suite 100, Austin, TX, 78758-
Duns: 039398891
Hubzone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Jin Choi
 Director for Advanced Technology
 (512) 334-7760
Business Contact
 Adam Feinstein
Title: Product Marketing Engineer
Phone: (512) 334-1208
Research Institution
 University of Texas at Austin
 Edward Yu
 Microelectronics Research Cent
10100 Burnet Rd., Bldg. 160
Austin, TX, 78758-
 (512) 232-5167
 Nonprofit college or university
In this phase 1 STTR, a roll-to-roll (R2R), high throughput nanoimprint lithography system and process prototype will be developed based on Molecular Imprints Inc."s Jet and Flash Imprint Lithography (J-FIL) technology. The R2R system will incorporate resist ink jetting with web tension control to achieve sub-50nm lithography and the following key process attributes: (i) Thin and uniform residual layer control with a target sub-15nm (mean) and sub-2nm (sigma); (ii) High aspect ratio patterns (>3:1 ratio) at 50nm resolution with arbitrary complexity; (iii) High throughput with target of>5m/min; and (iv) low resist material usage (~50-150 micro-liters/m2). The resulting process will allow pattern transfer into dielectrics and metal films with control in pattern size and complexity; and the cost structure will be attractive even for commodity applications such as thin-film solar cells. This process could be applied to applications such as large area sub-wavelength photonics devices, displays, and solar cells. We will focus on plasmonic nanostructures for thin-film solar cells based on amorphous silicon. We will perform simulation studies to obtain optimal plasmonic structures for maximizing absorption at long wavelengths over a broad band. We will then demonstrate fabrication (including pattern transfer) of these representative plasmonic patterns in appropriate film stacks.

* information listed above is at the time of submission.

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