Roll-to-Roll Printing of Patterned Nanomembranes on Flexible Substrates

Award Information
Agency:
Department of Defense
Branch
Air Force
Amount:
$100,000.00
Award Year:
2011
Program:
STTR
Phase:
Phase I
Contract:
FA9550-11-C-0059
Agency Tracking Number:
O10B-005-1033
Solicitation Year:
2010
Solicitation Topic Code:
OSD10-T005
Solicitation Number:
2010.B
Small Business Information
systeMech
2401 Crest Line Dr., Madison, WI, -
Hubzone Owned:
N
Socially and Economically Disadvantaged:
N
Woman Owned:
N
Duns:
96666953
Principal Investigator:
David Grierson
Principal
(608) 217-9700
dsgrierson@systemech.com
Business Contact:
David Grierson
Principal
(608) 217-9700
dsgrierson@systemech.com
Research Institution:
University of Wisconsin-Madison
Kim Moreland
Research and Sponsored Program
21 N. Park Street, Suite 6401
Madison, WI, 53715-1218
(608) 262-3822
Nonprofit college or university
Abstract
The objective of this phase I STTR project is to develop and demonstrate a roll-to-roll process for printing semiconductor and metal nanostructures with lateral dimensions as small as 100 nm on flexible substrates. systeMech will collaborate with the University of Wisconsin-Madison (Prof. M.G. Lagally"s group) to develop and characterize a process for transferring semiconductor and metal nanomembranes, which have been patterned via nanoimprint lithography at the wafer-level, to flexible substrates. The transfer of nanostructures patterned at the wafer-level has significant advantages over direct nanoimprinting, including better etching capabilities and fewer distortion problems. The primary objectives for phase I are: (1) Demonstrating retrieval of patterned nanostructures using a rotating stamp, (2) Demonstrating printing of nanostructures on flexible substrates using a rotating stamp, and (3) Designing a complete roll-to-roll manufacturing process capable of patterning>0.1 square meters. These objectives will be accomplished through mechanical modeling of the manufacturing process, retrieval and printing experiments, and process characterization. systeMech is a newly-formed small business, and the founders have experience in semiconductor manufacturing, mechanics, and nanoengineering. Prof. Max Lagally at the University of Wisconsin-Madison is a leader in nanomembrane processing for electronic and photonic devices and currently leads an AFOSR-funded MURI on nanomembranes.

* information listed above is at the time of submission.

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