Precise fabrication of photonic integrated systems using low cost nanoimprint process

Award Information
Agency:
Department of Defense
Branch
Office of the Secretary of Defense
Amount:
$100,000.00
Award Year:
2011
Program:
STTR
Phase:
Phase I
Contract:
FA9550-11-C-0070
Award Id:
n/a
Agency Tracking Number:
O10B-006-1040
Solicitation Year:
2010
Solicitation Topic Code:
OSD10-T006
Solicitation Number:
2010.B
Small Business Information
4515 settles bridge rd, Suwanee, GA, 30024-
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
966766482
Principal Investigator:
Murtaza Askari
Research Engineer
(404) 966-4669
murtazaaskari@gmail.com
Business Contact:
Paul Hart
Contracting Officer
(404) 894-6929
paul.hart@osp.gatech.edu
Research Institution:
Georgia Institute of Technology
Gary S May
777 Atlantic Dr
Atlanta, GA, 30332-
(404) 894-2902
Nonprofit college or university
Abstract
In this STTR proposal, we propose to develop a cost-effective and high-fidelity nanoimprint process for the fabrication of integrated photonics devices. VLSI photonics applications require a hig-level of control on device-to-device uniformity. Nanoimprint lithography (NIL) holds promise to overcome the current technological challenges in lithography while being cost effective at the same time. One of the key features of NIL is its ability to preserve and directly translate the lithography patterns from the mold, which should enable highly improved device-to-device uniformity within a die and between die-to-die on a wafer. In this proposal, we will demonstrate the feasibility of using NIL for photonics applications, especially for VLSI integrated photonics structures.We will develop a robust fabrication process that uses NIL to fabricate photonics structures. We will also demonstrate the feasibility of CMOS compatible and passive post fabrication tuning process based on NIL to tune the optical properties of the photonic structures. It will be shown in the course of this proposal that devices fabricated using NIL suffer from lower chip-to-chip variations than those fabricated using e-beam lithography while maintaining the same quality. This effort will also prove a first step for extending the application of NIL in opto-electronics and IC fabrication.

* information listed above is at the time of submission.

Agency Micro-sites


SBA logo

Department of Agriculture logo

Department of Commerce logo

Department of Defense logo

Department of Education logo

Department of Energy logo

Department of Health and Human Services logo

Department of Homeland Security logo

Department of Transportation logo

Enviromental Protection Agency logo

National Aeronautics and Space Administration logo

National Science Foundation logo
US Flag An Official Website of the United States Government