Anti-Reverse Engineering (RE) Techniques

Award Information
Agency: Department of Defense
Branch: Army
Contract: W31P4Q-11-C-0148
Agency Tracking Number: O102-A04-2201
Amount: $97,924.00
Phase: Phase I
Program: SBIR
Awards Year: 2011
Solicitation Year: 2010
Solicitation Topic Code: OSD10-A04
Solicitation Number: 2010.2
Small Business Information
Crossfield Technology LLC
9390 Research Blvd, Suite I200, Austin, TX, -
DUNS: 135494073
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Adam Jachniewicz
 Project Manager
 (512) 795-0220
Business Contact
 Dennis Ferguson
Title: Senior Partner
Phone: (512) 795-0220
Research Institution
Crossfield intends to show an anti-reverse engineering methodology that encompasses several innovative features to thwart reverse engineering attempts by third parties. This anti-reverse engineering methodology exploits doped resistive paths (DRPs) in the substrate and/or at the poly-silicon transistor gate levels. They can be formed by overlaying dopant fields implanted with multiple energies and species in the same region of device to generate unique electrical responses. The DRPs can be formed by using implants that are already a part of the semiconductor device process flow and made on open real estate regions on floor-plans of the existing device designs. With clever placement, the DRPs can be hidden either in the periphery areas, in-between regular circuits, or disguised within standard logic cells.

* information listed above is at the time of submission.

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