High performance and Cost Effective Diffraction Gratings by Projection Photolithography

Award Information
Agency:
Department of Defense
Branch
n/a
Amount:
$99,868.00
Award Year:
2011
Program:
SBIR
Phase:
Phase I
Contract:
FA8650-11-M-1081
Award Id:
n/a
Agency Tracking Number:
F103-173-1922
Solicitation Year:
2010
Solicitation Topic Code:
AF103-173
Solicitation Number:
2010.3
Small Business Information
875 Wilson Street, Unit C, Eugene, OR, -
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
105463603
Principal Investigator:
Thomas Mossberg
President/CTO
(541) 431-0027
twmoss@lightsmyth.com
Business Contact:
Dmitri Iazikov
Corporate Secretary
(541) 284-4544
dmitri@lightsmyth.com
Research Institution:
Stub




Abstract
Use of projection photolithography allows for fabrication of high fidelity diffraction gratings with individual control on location and shape of each groove using modern semiconductor tools and powerful computer-based simulation and CAD software. The method yields master-grade highly efficient diffraction gratings with high batch-to batch reproducibility at the fraction of the cost of regular holographic or mechanically ruled gratings. Proposal included development of the entire range of designs for hyperspectral imagers covering VIS, SWIR, MWIR and LWIR ranges, dual band grating design for MWIR/LWIR range and fabrication of VIS grating prototype all in Phase I. BENEFIT: Proposed method will be ideal for large volume, highly reproducible, high yield and high efficiency gratings requested by AirForce in the topic. The grating design and fabrication technology has been already proven in other types of diffraction gratings.

* information listed above is at the time of submission.

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