Versatile Micro/Nano-mechanical Load Frame For In Situ Studies

Award Information
Agency: Department of Defense
Branch: Army
Contract: W911QX-11-C-0111
Agency Tracking Number: A2-4524
Amount: $700,000.00
Phase: Phase II
Program: SBIR
Awards Year: 2011
Solitcitation Year: 2009
Solitcitation Topic Code: A09-055
Solitcitation Number: 2009.2
Small Business Information
Psylotech LLC
820 Davis Street, Suite 120, Evanston, IL, -
Duns: 002798794
Hubzone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Alex Arzoumanidis
 Manager
 (312) 859-7200
 aarz@psylotech.com
Business Contact
 Renee Souleles
Title: President
Phone: (847) 508-4797
Email: rsoul@psylotech.com
Research Institution
 Stub
Abstract
Small scale mechanical testing is often a bottleneck in micro and nanocomposite materials development. The proposed Psylotech system is a miniature universal test system that accommodates rigid materials and soft materials, such as biological tissues and rubber in the form of uniaxially loaded samples. The Psylotech nano/micro/milli Test System (nTS) is the evolution and integration of systems developed by Dr. Chasiotis at UIUC with the addition of large stroke for ultra ductile materials and liquid environment testing. It has been designed to be capable of spanning 7 orders of magnitude in length scales (20 mm to 5 nm) and 9 orders of magnitude in load scales (40 N to 25 nN), taking advantage of proprietary high resolution sensor technology, precision actuators and methods for high temporal and spatial resolution experiments with micron and submicron ductile and brittle structures (UIUC patent pending). The nTS is specifically designed to facilitate the use of Digital Image Correlation strain field measurement in concert with a variety of microscopy techniques, notably Atomic Force, Environmental Scanning Electron, Optical and confocal laser microscopy. The nTS design also incorporates testing packages for Dynamic Mechanical Analysis and in-vivo testing on submersed specimens.

* information listed above is at the time of submission.

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