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A Quantitative Non-destructive Residual Stress Assessment Tool for Pipelines
Title: CTO
Phone: (303) 304-9785
Email: Angelique@g2mt.com
Title: CEO
Phone: (303) 895-7146
Email: josh@g2mt.com
There exists a wide-range need in both industry and government for quantitative residual stress measurements. Generation 2 Materials Technology LLC (G2MT) will collaborate with partners from industry and government to calibrate and commercialize the eStress system to assess residual stress from mechanical damage and re-rounding. The industrial members, consortiums, and government laboratories who have agreed to provide support and/or cost-share for this Phase II initiative represent a wide range of potential users: Stress Engineering Services, Structural Integrity Associates, Lloyds Energy Americas, ASME International, Pipeline Research Council International, TMR Exploration, Shell, Conoco-Phillips, British Petroleum, the Canadian Neutron Beam Centre, and the National Aeronautics and Space Administration.
The Phase II technical objectives include:
Objective 1. Begin calibrations to develop eStress™ system to quantify residual stress on all common grades of pipeline steel, which can have yield strengths from 40 ksi (past)to 120 ksi (future).
Objective 2. Calibrate eStress™ system to quantify the residual stress measurements.
Objective 3. Calibrate eStress™ system for all other variables associated with steel pipelines to increase accuracy of eStress™ system.
Objective 4: Calibrate eStress™ system for lift-off variations due to coatings, corrosion product, user handling of sensors, etc.
Objective 5: Complete the packaging of the eStress™ system for the field.
Objective 6: Determination of optimum data form for integrity management program.
Objective 7: Develop training procedures and manuals to use the eStress™ system.
Objective 8: Develop new codes and standards for acceptable residual stress levels for
mechanical damage.
Objective 9: Deploy the eStress™ system in the field.
* Information listed above is at the time of submission. *