Technologies for Nanoscale Imaging Using Coherent Extreme Ultraviolet and Soft X-Ray Light

Award Information
Agency: Department of Defense
Branch: Air Force
Contract: FA9550-12-C-0051
Agency Tracking Number: F11B-T11-0028
Amount: $99,964.00
Phase: Phase I
Program: STTR
Awards Year: 2012
Solicitation Year: 2011
Solicitation Topic Code: AF11-BT11
Solicitation Number: 2011.B
Small Business Information
1855 South 57th Court, Boulder, CO, -
DUNS: 160015093
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Daisy Raymondson
 Research Scientist
 (303) 544-9068
Business Contact
 Sterling Backus
Title: VP of Research and Development
Phone: (303) 544-9068
Research Institution
 Randall W Draper
 University of Colorado
Boulder, CO, 80309-
 (303) 492-2695
 Nonprofit college or university
ABSTRACT: Microscopy is a critical enabling technology for advancing our understanding of nature. Imaging nanoscale objects with light in the extreme ultraviolet (EUV) and soft x-ray regions of the spectrum has advantages over visible light for resolution, elemental specificity, and imaging internal structures. Coherent diffractive imaging (CDI) has been developed as a tool to get around the limitations of available x-ray optics. In recent years CDI has shown very high, near wavelength resolution when used with EUV light from high harmonic upconversion from ultrafast lasers. We propose to develop a complete tabletop EUV microscope instrument that is tunable in wavelength from 30 to 2.5nm (40 to 500 eV). The key to creating a practical instrument will be developing a driving laser that is specifically tailored to driving high harmonic generation that is phase matched over this entire wavelength range, while requiring little alignment and maintenance. In Phase I we will design a driving laser based on fiber and operating at 1560 nm wavelength, and qualify key aspects of the design. This microscope will have broad application in basic research, materials studies, lithography, and medicine. BENEFIT: The microscope to be developed under this program will have broad application in basic research, materials studies, lithography, and medicine. It will have the capability to do at-wavelength mask inspection for semiconductor lithography at 13.5 nm. It will be able to do full-field imaging of whole, unstained cells without the need for sectioning, with resolution of ~10nm or better. This microscope should find a broad commercial market in addition to the DoD needs for nano-materials identification and battlefield medicine.

* Information listed above is at the time of submission. *

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