Low Defect Density Mercury Cadmium Telluride on Silicon by Bulk Layer Transfer

Award Information
Agency:
Department of Defense
Branch
Missile Defense Agency
Amount:
$999,964.00
Award Year:
2012
Program:
STTR
Phase:
Phase II
Contract:
HQ0147-12-C-7169
Award Id:
n/a
Agency Tracking Number:
B2-1862
Solicitation Year:
2011
Solicitation Topic Code:
MDA11-T002
Solicitation Number:
2011.A
Small Business Information
2724 SAWBURY BOULEVARD, COLUMBUS, OH, -
Hubzone Owned:
N
Minority Owned:
Y
Woman Owned:
N
Duns:
609463302
Principal Investigator:
VincentStenger
Principal Research Engineer
(614) 799-0664
judith@srico.com
Business Contact:
SriSriram
President&CEO
(614) 578-0684
sri@srico.com
Research Institute:
University of Illinois at Chicago
Mitra Dutta
1737 W. Polk Street
310 AOB, M/C 672
Chicago, IL, 60612-7227
(312) 996-2862

Abstract
The goal of this STTR project is to develop an engineered growth substrate technology that will enable low defect MCT growth on silicon that is comparable in defect density to MCT grown on lattice matched CZT substrates. The layer transfer process elements demonstrated in Phase I will be further optimized to produce low defect density MCT on silicon substrates in Phase II. SRICO will achieve this by physical layer transfer of a bulk quality CZT layer to silicon by using wafer scale methods essentially the same as those used in the highly successful"Smart-cut"silicon-on-insulator (SOI) process. The effort will leverage SRICO"s state-of-the-art ion-slicing techniques for maintaining growth surface layer quality. Process optimization and small scale demonstration of quality MCT growths on engineered growth substrates will be performed in collaboration with SRICO"s STTR partner. Phase II would focus on optimization and scaling up of the technology and on demonstration of FPA device elements formed in the grown MCT films on the engineered substrates.

* information listed above is at the time of submission.

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