High Voltage Metal Insulator Metal (MIM) Capacitor Technology

Award Information
Agency:
Department of Defense
Branch
n/a
Amount:
$80,000.00
Award Year:
2012
Program:
SBIR
Phase:
Phase I
Contract:
N00024-12-P-4093
Award Id:
n/a
Agency Tracking Number:
N121-071-1268
Solicitation Year:
2012
Solicitation Topic Code:
N121-071
Solicitation Number:
2012.1
Small Business Information
1980 Olivera Ave, Suite D, Concord, CA, -
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
149397015
Principal Investigator:
Jeff Brown
Senior Scientist
(925) 798-5770
jbrown@acreetech.com
Business Contact:
Mike McFarland
Principal Scientist
(925) 798-5770
mcfarland@acreetech.com
Research Institution:
Stub




Abstract
This purpose of this project is to develop high-k dielectrics and processes suitable for use in Metal-Insulator-Metal capacitors for incorporation into GaN Monolithic Microwave Integrated Circuits. An energetic deposition process will be used that has been demonstrated to produce high quality, high-k films ideally suited for this application. The proposed deposition process is superior to other Physical Vapor Deposition (PVD) processes and to Atomic Layer Deposition. This deposition process allows virtually any arbitrary metal oxide to be easily deposited with high quality allowing different high-k dielectrics to be straightforwardly evaluated. The coatings have high adhesion, are pin-hole and defect free, and contain no impurities from the deposition process. Acree Technologies Incorporated"s experience in the development of innovative coating processes makes us uniquely suited for the successful realization of the desired film, process and equipment for integration into existing foundries.

* information listed above is at the time of submission.

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