Meter-Scale Electromagnetic Metamaterial Manufacturing for ShipBoard Applications (1000-223)

Award Information
Agency: Department of Defense
Branch: Navy
Contract: N00014-12-M-0218
Agency Tracking Number: N121-086-0343
Amount: $79,995.00
Phase: Phase I
Program: SBIR
Awards Year: 2012
Solicitation Year: 2012
Solicitation Topic Code: N121-086
Solicitation Number: 2012.1
Small Business Information
SI2 Technologies
267 Boston Road, North Billerica, MA, -
DUNS: 13-164091
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Thomas Fusco
 Principal Investigator
 (978) 495-5300
Business Contact
 Noel Burgoa
Title: Business Director
Phone: (978) 495-5300
Research Institution
SI2 Technologies, Inc (SI2) proposes to leverage its expertise in Direct Write inkjet printing with its experience in electromagnetic (EM) design to manufacture low cost, multiple meter scale, multi-layered, electromagnetic metamaterial structures capable of operating over large radio frequency (RF) ranges for Naval shipboard applications. Metamaterial designs and inkjet printing have been demonstrated for many years but applications have been limited by available manufacturing processes resulting in poor performance at too high a cost. In addition, most inkjet printing of advanced electronic materials has been limited by material availability and equipment size limitations, typically less than 12 inches square. Only recently has inkjet printing been demonstrated to print large continuous rolls of electronic materials cost effectively. SI2 has been at the forefront of that development with its roll to roll Direct Write inkjet technology. In the Phase I effort, SI2 will design and manufacture a meter-sized electromagnetic metamaterial structure for use in a frequency band relevant to Navy applications. The Phase I feasibility study will form the basis of the Phase II where the scale of the metamaterial manufacturing will be increased and guided towards a more specific application defined during the Phase I effort.

* information listed above is at the time of submission.

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