Planar, Low Switching Loss Bulk InAlN/GaN Based HEMTS for Power Conversion Applications

Award Information
Agency:
Department of Defense
Branch
n/a
Amount:
$80,000.00
Award Year:
2012
Program:
SBIR
Phase:
Phase I
Contract:
N00014-12-M-0180
Agency Tracking Number:
N121-090-0808
Solicitation Year:
2012
Solicitation Topic Code:
N121-090
Solicitation Number:
2012.1
Small Business Information
Kyma Technologies, Inc.
8829 Midway West Road, Raleigh, NC, -
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
020080607
Principal Investigator:
Jacob Leach
Director of Production
(919) 789-8880
leach@kymatech.com
Business Contact:
Heather Splawn
COO
(919) 789-8880
contracts@kymatech.com
Research Institution:
Stub




Abstract
In this proposal, we build on demonstrated expertise in Bulk GaN growth (Kyma Technologies), Design and simulation of Power Devices and systems (NextWatt LLC), Epitaxial Growth of High Performance HEMT heterostructures (Virginia Commonwealth University), and Fabrication of Advanced Semiconductor Devices (The Pennsylvania State University). The effort aims to develop a high power normally-off HEMT based on InAlN/GaN epilayers grown on bulk GaN substrates. The work naturally stems from proven efforts in the realm of high performance RF FETs already developed by prior and ongoing collaborations within the team. This effort will build on the high quality materials and advanced device performances already demonstrated from previous works and apply them for use in power HEMT devices. The unique capabilities of the team and existing collaborative efforts make the team well positioned to successfully achieve normally-off high power switching HEMTs with VT>1V, VBR>1000V, RON<20-mm and low gate and drain leakage values of<1A/mm.

* information listed above is at the time of submission.

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