Rapid, contamination-free growth of larger size aluminum oxynitride (AlON) and aluminum nitride (AlN) single crystals

Award Information
Agency:
Department of Defense
Branch
Army
Amount:
$729,639.00
Award Year:
2012
Program:
SBIR
Phase:
Phase II
Contract:
W911QX-12-C-0012
Award Id:
n/a
Agency Tracking Number:
A2-4673
Solicitation Year:
2010
Solicitation Topic Code:
A10-061
Solicitation Number:
2010.2
Small Business Information
1366 Ridge Master Drive, State College, PA, -
Hubzone Owned:
N
Minority Owned:
Y
Woman Owned:
N
Duns:
153219675
Principal Investigator:
YunjinZhang
Material Engineering
(814) 238-5982
yjzhang@gos-us.com
Business Contact:
StuartYin
Chief Technology Officer
(814) 238-5982
shizhuo_yin@yahoo.com
Research Institute:
Stub




Abstract
The objective of this SBIR Phase II effort is to grow larger size (50 mm diameter x 25 mm thick or larger) single crystals of aluminum oxynitride (AlON) and aluminum nitride (AlN) by refining and optimizing the rapid and contamination free growth method developed at the Phase I stage. The major properties of the single crystals will be quantitatively characterized and evaluated. The crystals should be at the single crystal phase, have a high linear transmittance (85 % or higher) over the entire UV-VIS-IR spectral range, and are optically isotropic. Elastic constants and dielectric properties of larger size samples (50 mm diameter x 25 mm thick, developed at the Phase II stage) will be measured by ultrasonic pulse echo technique and compared with the data obtained from the small samples (~ 2 mm cube) measured by resonant ultrasound spectroscopy (RUS). Phase II effort also includes investigating the killer applications of these unique single crystals and commercializing them such as (1) providing the critical technical data for studying the materials in extreme dynamic environments (such as transparent armors), (2) broadband, high strength optical windows and domes, (3) high power electronic substrates, and (4) robust, broad temperature range actuators and sensors.

* information listed above is at the time of submission.

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