Usage of Electron Beams for Near-Petabyte CD-Data Storage and Bulk Materials Processing

Award Information
Agency:
Department of Defense
Branch
Navy
Amount:
$749,865.00
Award Year:
2012
Program:
SBIR
Phase:
Phase II
Contract:
N00014-12-C-0373
Award Id:
n/a
Agency Tracking Number:
N111-065-1350
Solicitation Year:
2011
Solicitation Topic Code:
N111-065
Solicitation Number:
2011.1
Small Business Information
200 Yellow Place, Pines Industrial Center, Rockledge, FL, -
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
175302579
Principal Investigator:
Justin Hill
Engineer
(321) 631-3550
jhill@mainstream-engr.com
Business Contact:
Michael Rizzo
CFO
(321) 631-3550
mar@mainstream-engr.com
Research Institute:
Stub




Abstract
High power, superconducting electron linear accelerators represent a new method of producing highly focused and bright electron beams (Ebeams). These instruments have exciting applications in the area of free electron lasers and directed energy weapons, but are costly and the two markets are small and highly specialized. Using these high energy Ebeams for materials processing may open up additional markets and provide a technological edge in applications exhibiting material-based deficiencies. In Phase I, Mainstream identified several materials processes, determined the required Ebeam parameters and projected their respective market sizes as well as commercial feasibility. In Phase II Mainstream will demonstrate Ebeam processing of selected materials with target applications and assess their application in technologically deficient areas. To accomplish this, a new type of superconducting electron linear accelerator will be constructed in partnership with a leading US Ebeam manufacturer and software will be developed to aid technicians in predicting the required Ebeam processing parameters. Phase II development will establish a marketplace for these highly specialized Ebeams as well as demonstrate several new materials technologies, which will be transitioned to high value and high demand products during follow-on effort.

* information listed above is at the time of submission.

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