Novel Rapid Chemical Mechanical Polishing (CMP) Process for Fabrication of High Performance CVD Diamond Particle Detectors

Award Information
Agency:
Department of Energy
Branch
n/a
Amount:
$999,704.00
Award Year:
2013
Program:
SBIR
Phase:
Phase II
Contract:
DE-FG02-12ER86520
Award Id:
n/a
Agency Tracking Number:
99369
Solicitation Year:
2013
Solicitation Topic Code:
31a
Solicitation Number:
DE-FOA-0000782
Small Business Information
1912 NW 67th Place, Gainesville, FL, -
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
Y
Duns:
024935517
Principal Investigator:
Arul Arjunan
Dr.
(352) 334-7270
arul@sinmat.com
Business Contact:
Deepika Singh
Dr.
(352) 334-7237
singh@sinmat.com
Research Institute:
Stub




Abstract
Diamond possesses excellent particle detection characteristics, which makes it indispensible for its use in the radiation hard ultra-fast detectors for high energy physics applications. For such applications, damage free, ultra-smooth chemical vapor deposition diamond substrates of large area are required. Though large area polycrystalline diamond substrates are currently available in the market, the surface damage of the material makes it undesirable for detector applications. The company has developed a novel rapid chemical mechanical polishing process to polish poly-crystalline diamond crystal surfaces. This method is based on enhanced chemical action in a tribological environment resulting in damage-free, ultra-smooth surfaces. The company will use this method to fabricate diamond substrates to fabricate high performance detectors in the project. In Phase I the company successfully demonstrated excellent detector performance obtained from diamond plates finished with this polishing method. This achievement represents the first demonstration of production of damage-free diamond polished surfaces on bulk substrates. The Phase II effort will further leverage this process to make large area diamond detectors for high energy physics applications. Applying standard microelectronic methods and combining with optimized polishing process high crystalline quality, diamond wafers will be fabricated. Such substrates would be tested for detector applications. The research team comprising of leading global companies and institutions in diamond technology will spearhead this effort. Commercial Application and Other Benefits: The technology to fabricate ultra-smooth defect surfaces on diamond crystal will be beneficial to many applications in the field of X-ray physics, particle physics, and nuclear physics. The current and future upgrades of national and international facilities related to high energy physics, nuclear research facilities, nuclear radiators, and X-ray synchrotrons need diamond based detectors and optics. Additionally, ultra-smooth diamond substrates can also be used for heat dissipation in silicon based electronics.

* information listed above is at the time of submission.

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