In-Situ Monitoring during HVPE for the Producibility of Semi-Insulating GaN

Award Information
Agency:
Department of Defense
Branch
Missile Defense Agency
Amount:
$99,969.00
Award Year:
2010
Program:
STTR
Phase:
Phase I
Contract:
HQ0006-10-C-7399
Award Id:
94836
Agency Tracking Number:
B09B-001-0060
Solicitation Year:
n/a
Solicitation Topic Code:
MDA 09T001
Solicitation Number:
n/a
Small Business Information
8829 Midway West Road, Raleigh, NC, 27617
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
020080607
Principal Investigator:
RobertMetzger
Chief Engineer
(919) 789-8880
metzger@kymatech.com
Business Contact:
KeithEvans
CEO
(919) 789-8880
evans@kymatech.com
Research Institute:
University of Nevada at Las Vegas
Rama Venkat
4505 S Maryland Pkwy
Las Vegas, NV, 89183
(702) 895-1094

Abstract
This program will utilize in-situ monitoring devices during the HVPE growth of GaN in conjunction with thermal and gas flow modeling, to establish tighter tolerances over growth variables such as substrate temperature and growth rate, which will lead to more robust, producible HVPE GaN growth processes, and in turn increase large area wafer yield and boule thicknesses. The in-situ monitoring devices which will be used are a Laytec EpiTT 3-wavelength pyrometer to directly measure substrate temperature throughout the GaN HVPE process, and a deep UV source/spectrometer that will be used to monitor the GaCl precursor concentration above the growing GaN surface. These tools will help establish a robust, producible GaN HVPE process capable of producing large area bulk wafers and boules of thicknesses 1 cm and greater.

* information listed above is at the time of submission.

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