Nanometer Precision in Maskless Lithography via Software

Award Information
Agency:
Department of Defense
Branch
Defense Advanced Research Projects Agency
Amount:
$1,559,217.00
Award Year:
2010
Program:
SBIR
Phase:
Phase II
Contract:
W91CRB-10-C-0113
Agency Tracking Number:
07SB1-0002
Solicitation Year:
2007
Solicitation Topic Code:
N07-035
Solicitation Number:
2007.1
Small Business Information
Lumarray LLC
60 Vassar Street, Bldg. 39, Room 427, Cambridge, MA, -
Hubzone Owned:
N
Socially and Economically Disadvantaged:
N
Woman Owned:
N
Duns:
135947088
Principal Investigator:
Henry Smith
President
(617) 253-6865
hismith@nano.mit.edu
Business Contact:
Nicholas Economou
CEO
(781) 862-0084
neconomou@rcn.com
Research Institution:
Stub




Abstract
LumArray, Inc. proposes under Phase II to further improve its maskless zone-plate-array lithography system, to meet the requirements of manufacturers of custom chips for the DoD. Under Phase I, a prototype alpha tool was developed, the ZP-150ATM. Under Phase II we will develop and demonstrate a beta tool, the ZP-150BTM, which will have features beyond those available on the alpha tool. Specifically, the ZP-150BTM will have: (1) exposure-dose monitoring and correction of exposure-dose errors; (2) enhanced throughput by virtue of multiple spatial-light modulators, variable spot size, and improved spatial-light modulation; (3) higher-speed computation via a graphics processing unit (GPU); and (4) revisions to support these added functionalities. The ZP-150BTM will be designed for compatibility with future improvements in resolution afforded by absorbance-modulation optical lithography, a LumArray invention. LumArray's maskless lithograpy systems are compatible with both mask making and direct writing on substrates. These systems will radically streamline and speed up the design and manufacture of custom circuits, especially those manufactured in low volume for the DoD. This in turn will enhance the capability and responsiveness of military systems.

* information listed above is at the time of submission.

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