A HIGH INTENSITY EXCIMER UV SOURCE FOR SEMICONDUCTOR MANUFACTURING

Award Information
Agency:
National Science Foundation
Branch
n/a
Amount:
$64,996.00
Award Year:
1994
Program:
SBIR
Phase:
Phase I
Contract:
n/a
Award Id:
27456
Agency Tracking Number:
27456
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
Adelphi Technology Inc. (Currently Adelphi Technology, Inc.)
2181 Park Blvd, Palo Alto, CA, 94306
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
David G Boyers
(415) 328-7337
Business Contact:
() -
Research Institution:
n/a
Abstract
THE OBJECTIVE OF THIS RESEARCH IS TO EXPLORE THE FEASIBILITY OF DEVELOPING A HIGH INTENSITY UV EXCIMER SOURCE FOR THE DEMANDING REQUIREMENTS OF THE SEMICONDUCTOR MANUFACTURING AND MATERIALS PROCESSING INDUSTRY. EMERGING PROCESSING TECHNOLOGIES NOT REQUIRING A COHERENT SOURCE INCLUDING UV WAFER CLEANING AND PHOTO CVD WILL REQUIRE VERY HIGH UV INTENSITIES OVER LARGE AREAS (100 MW/CM2) CURRENTLY ONLY AVAILABLE FROM EXCIMER LASERS. CONVENTIONAL UV LAMPS ARE INADEQUATE FOR THE TASK. EXCIMER LASERS CANNOT CONVENIENTLY ILLUMINATE A LARGE FIELD SIZE, ARE OFTEN DIFFICULT TO INTEGRATE INTO A PRODUCTION TOOL, AND HAVE A VERY HIGH COST OF OWNERSHIP. THE RESEARCH WILL BE DIRECTED TOWARD ESTABLISHING THE FEASIBILITY OF DEVELOPING A UV EXCIMER LAMP AND EXCITATION SOURCE WITH THE REQUIRED PERFORMANCE: (1) A LAMP AND EXCITATION SOURCE WILL BE DESIGNED AND FABRICATED; (2) THE SPECTRUM AND UV EFFICIENCY WILL BE MEASURED WITH PURE XE (172 NM); AND (3) A PRELIMINARY FULL SCALE DESIGN AND COST ESTIMATE WILL BE PREPARED.

* information listed above is at the time of submission.

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