Synchrotron Mimic for Lithography

Award Information
Agency:
National Science Foundation
Branch
n/a
Amount:
$100,000.00
Award Year:
2002
Program:
SBIR
Phase:
Phase I
Contract:
n/a
Agency Tracking Number:
0214819
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
Adelphi Technology, Inc
2181 Park Boulevard, Palo Alto, CA, 94306
Hubzone Owned:
N
Socially and Economically Disadvantaged:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
Melvin Piestrup
(650) 328-7337
melpie@adelphitech.com
Business Contact:
() -
Research Institution:
n/a
Abstract
This Small Business Innovation Research (SBIR) Phase I project will develop a compact source for lithography. As a synchrotron equivalent, this proposal presents a single-stepper, XUV or soft-x-ray source, which offers high brightness, high collimation, modest operating vacuum, excellent spectrum and moderate cost. The x-rays are generated inside a compact betatron by the electrons passing through thin radiators made of thin metal foils, crystals or multi-layers producing a forward-directed beam of x-rays whose photon energies can be XUV, soft and hard x-ray depending upon choice of radiator. As a synchrotron mimic, the source can have many applications. For lithography the x-ray wavelength can be optimized for highest photo-resist sensitivity, e.g.1.4 nm. In a proof of principal experiments, tunable monochromatic x-rays from thin crystal and multi-layer radiators mounted inside a betatron have been observed. Pulse-height spectra were obtained and tuned by rocking the crystal or multi-layer relative to the electron-beam direction. We will use our existing experimental apparatus to demonstrate high x-ray flux at soft x-ray wavelengths. Potential commercial applications effort will demonstrate the capability of generating XUV and x-rays for lithography and crystallography. It can also function also as a medical source for imaging and as a laboratory source for scientific purposes now relegated exclusively to synchrotrons.

* information listed above is at the time of submission.

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