Cubic Silicon Carbide Substrates

Award Information
Agency:
Department of Defense
Branch
Air Force
Amount:
$281,250.00
Award Year:
1994
Program:
SBIR
Phase:
Phase II
Contract:
n/a
Award Id:
20191
Agency Tracking Number:
20191
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
7 Commerce Drive, Danbury, CT, 06810
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
Woo Sik Yoo
(203) 794-1100
Business Contact:
() -
Research Institution:
n/a
Abstract
Silicon carbide promises near-term insertion in high power, high temperature, applications. The wide band-gap and consequent high breakdown field of silicon carbide theoretically allows efficient high power solid state power amplifiers. Its high thermal conductivity will permit compact devices and high power density. To date, virtually all silicon carbide-based devices have been fabricated using 6H-SiC; recent advances in bulk and epitaxial 6H-SiC crystal growth have increased its availability. However, 6H-SiC may not be the preferred polytype. The performance of high power and high frequency devices would significantly increase if 3C-SiC, the cubic form, were available. 3C-SiC has twice the electron and hole mobilities of 6H-SiC and has a slightly higher saturation electron drift velocity. In Phase I the feasibility of 3C-SiC substrate growth will be demonstrated with an innovative sublimation crucible design. The objective for Phase II is to optimize the growth of 3C-SiC substrates for device demonstrations. In Phae III, ATM and its partners will scale the crystal growth process to enable the manufacture of specific devices and to supply substrates in order to accelerate the growth of an SiC-based semiconductor industry.

* information listed above is at the time of submission.

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