PHOTO CHEMICAL VAPOR DEPOSITION OF BARIUM TITANATE

Award Information
Agency:
National Science Foundation
Branch
n/a
Amount:
$50,000.00
Award Year:
1993
Program:
SBIR
Phase:
Phase I
Contract:
n/a
Award Id:
21572
Agency Tracking Number:
21572
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
7 Commerce Dr, Danbury, CT, 06810
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
Jiming Zhang
(203) 794-1100
Business Contact:
() -
Research Institute:
n/a
Abstract
FERROELECTRICS SHOW GREAT PROMISE AS ELECTRONIC MATERIALS IN APPLICATIONS RANGING FROM INFRARED DETECTORS TO OPTICAL SWITCHES. BRIUM TITANATE (BATIO3) IS AN ESPECIALLY PROMISING MATERIAL FOR THIN FILM CAPACITOR APPLICATIONS IN ULTRA-LARGE SCALE INTEGRATED CIRCUITS. CONVENTIONAL CHEMICAL VAPOR DEPOSITION (CVD) PROCESSING OF BATIO3 THIN FILMS REQUIRES TEMPERATURES THAT ARE INCOMPATIBLE WITH STANDARD SILICON PROCESSING TECHNOLOGY. PLASMA ENHANCED CVD OF BATIO3 SHOWS SOME POTENTIAL FOR LOWERING TEMPERATURES, BUT IT IS DIFFICULT TO ACHIEVE LARGE-SCALE UNIFORMITY. BOTH THE NON-UNIFORMITY AND TEMPERATURE PROBLEMS MAY BE SOLVED BY THE USE OF A NOVEL PHOTO-ENHANCED CVD PROCESS WHOSE FEASIBILITY WILL BE DETERMINED IN THIS STUDY.

* information listed above is at the time of submission.

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