High Performance Thin Film Microactuator Materials
Department of Defense
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Small Business Information
Advanced Technology Materials
7 Commerce Drive, Danbury, CT, 06810
Socially and Economically Disadvantaged:
Dr Jeffrey F. Roeder
AbstractThe potential applications of microelectromechanical systems (MEMS) have only begun to be recognized. This technology demands thin film materials with exceptional microstructural quality for high performance and processes with high yields. For piezoelectric microactuator applications, thin film lead zirconate titanate (PZT) is the leading material choice. Furthermore, substitutional modifications offer the possibility for drastically reduced drive voltages necessary for actuation. A significant opportunity exists to develop a new process for deposition of a thin film microactuator material based on PZT. Metalorganic chemical vapor deposition (MOCVD) is the method of choice because it yields excellent microcrystallinity, has high deposition rates, and scales to large areas. Preliminary results at ATMI indicate that the deposition of high quality substitutionally modified thin films based on PZT is possible by MOCVD. In Phase I, we will develop this process for microactuator applications. Actuation an the piezoelectric coefficients of both unmodified and modified PZT will be measured at Honeywell Technology Center. Phase II will result in a process optimized for microfabricated cantilever devices, which will be fabricated with Honeywell.
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