Gas-Phase Deposition of Low Dielectric Polymers

Award Information
Agency: Department of Defense
Branch: Missile Defense Agency
Contract: N/A
Agency Tracking Number: 28356
Amount: $60,000.00
Phase: Phase I
Program: SBIR
Awards Year: 1995
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
Advanced Technology Materials
7 Commerce Dr, Danbury, CT, 06810
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Thomas H. Baum
 (203) 794-1100
Business Contact
Phone: () -
Research Institution
N/A
Abstract
Phase I will develop a gas-phase process for the deposition of low dielectric constant polymers for use in integrated circuits. This process will utilize the firm's liquid delivery technology to deliver the reactants and grow films at high deposition rates. Polymerization will be induced by thermal activation on a heated substrate. This novel approach to polymeric film growth enables the deposition of a wide variety of polymers displaying low dielectric constants. This technique has broad applications for IC packaging, lithography and microelectronics processing.

* information listed above is at the time of submission.

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