AlN Based Extreme Ultraviolet (EUV) Detectors

Award Information
Agency:
National Aeronautics and Space Administration
Branch
n/a
Amount:
$100,000.00
Award Year:
2006
Program:
STTR
Phase:
Phase I
Contract:
NNG06LA43C
Award Id:
80764
Agency Tracking Number:
050097
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
2033 Plymouth Road, Manhattan, KS, 66503
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
017213773
Principal Investigator:
Jing Li
Principal Investigator
(785) 341-4483
3n@3n-tech.com
Business Contact:
Jing Li
R & D Manager
(785) 341-4484
3n@3n-tech.com
Research Institution:
Kansas State University
Paul Lowe
2 Fairchild Hall, KSU
Manhattan, KS, 66506
(785) 532-6804
Nonprofit college or university
Abstract
This Phase I project is to investigate the feasibility for achieving EUV detectors for space applications by exploiting the ultrahigh bandgap semiconductor - AlN. We plan to devise methods to improve the AlN epitaxial material quality and device structures for EUV detectors. Specifically, we will study the properties of Si and Mg doped AlN epilayers and investigate n- and p-type doping issues in AlN and hence the feasibility for achieving high performance EUV detectors; improve the AlN material quality by exploiting novel template/substrates and growth schemes to reduce the dislocation and native defect density. Use knowledge gained from these investigations to provide new understanding of the III-nitride system and to improve EUV detector structural design. It is intended that EUV detector wafers will also be delivered to NASA scientists for the fabrication of detector arrays. Improved performances of AlN based EUV detectors over conventional existing technologies are expected.

* information listed above is at the time of submission.

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