Novel Antireflective Coating to Improve Microelectronic Processings

Award Information
Agency: Department of Defense
Branch: Missile Defense Agency
Contract: DASG60-01-C-0065
Agency Tracking Number: 00-0877
Amount: $1,600,000.00
Phase: Phase II
Program: SBIR
Awards Year: 2001
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
9 Linnell Circle, Billerica, MA, 01821
DUNS: 611655440
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Mario Cazeca
 Senior Scientist
 (978) 663-7652
 mcazeca@astp.com
Business Contact
 Ih-Houng Loh
Title: President
Phone: (978) 663-7652
Email: iloh@astp.com
Research Institution
N/A
Abstract
One of the primary processes used for device patterning in the electronics industry is deep ultaviolet photolithography. However, the highly reflective substrates require reduction of this reflectivity to minimize standing waves and to maintain tightdimensional control. Most of te industry uses anti-reflective coatings (ARCs) which are applied using the spin coating technique. Unfortunately, spin coating is not a conformal coating and tends to planarize complex geometries, essentially filling in theholes and rounding the features. This results in erosin of feature sidewalls and loss of dimensional integrity. The industry requires a new process for application of ARCs which is highly conformal, has low defect density and is equally applicable tosubstrates up to 12

* Information listed above is at the time of submission. *

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