Novel Antireflective Coating to Improve Microelectronic Processings

Award Information
Agency:
Department of Defense
Amount:
$1,600,000.00
Program:
SBIR
Contract:
DASG60-01-C-0065
Solitcitation Year:
N/A
Solicitation Number:
N/A
Branch:
Missile Defense Agency
Award Year:
2001
Phase:
Phase II
Agency Tracking Number:
00-0877
Solicitation Topic Code:
N/A
Small Business Information
AST PRODUCTS, INC.
9 Linnell Circle, Billerica, MA, 01821
Hubzone Owned:
N
Woman Owned:
N
Socially and Economically Disadvantaged:
N
Duns:
611655440
Principal Investigator
 Mario Cazeca
 Senior Scientist
 (978) 663-7652
 mcazeca@astp.com
Business Contact
 Ih-Houng Loh
Title: President
Phone: (978) 663-7652
Email: iloh@astp.com
Research Institution
N/A
Abstract
One of the primary processes used for device patterning in the electronics industry is deep ultaviolet photolithography. However, the highly reflective substrates require reduction of this reflectivity to minimize standing waves and to maintain tightdimensional control. Most of te industry uses anti-reflective coatings (ARCs) which are applied using the spin coating technique. Unfortunately, spin coating is not a conformal coating and tends to planarize complex geometries, essentially filling in theholes and rounding the features. This results in erosin of feature sidewalls and loss of dimensional integrity. The industry requires a new process for application of ARCs which is highly conformal, has low defect density and is equally applicable tosubstrates up to 12

* information listed above is at the time of submission.

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