Novel Antireflective Coating to Improve Microelectronic Processings

Award Information
Agency:
Department of Defense
Branch
Missile Defense Agency
Amount:
$1,600,000.00
Award Year:
2001
Program:
SBIR
Phase:
Phase II
Contract:
DASG60-01-C-0065
Agency Tracking Number:
00-0877
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
AST PRODUCTS, INC.
9 Linnell Circle, Billerica, MA, 01821
Hubzone Owned:
N
Socially and Economically Disadvantaged:
N
Woman Owned:
N
Duns:
611655440
Principal Investigator:
Mario Cazeca
Senior Scientist
(978) 663-7652
mcazeca@astp.com
Business Contact:
Ih-Houng Loh
President
(978) 663-7652
iloh@astp.com
Research Institution:
n/a
Abstract
One of the primary processes used for device patterning in the electronics industry is deep ultaviolet photolithography. However, the highly reflective substrates require reduction of this reflectivity to minimize standing waves and to maintain tightdimensional control. Most of te industry uses anti-reflective coatings (ARCs) which are applied using the spin coating technique. Unfortunately, spin coating is not a conformal coating and tends to planarize complex geometries, essentially filling in theholes and rounding the features. This results in erosin of feature sidewalls and loss of dimensional integrity. The industry requires a new process for application of ARCs which is highly conformal, has low defect density and is equally applicable tosubstrates up to 12

* information listed above is at the time of submission.

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