ATOMIC CHLORINE SOURCE FOR SEMICONDUCTOR ETCHING STUDIES

Award Information
Agency:
National Science Foundation
Branch
n/a
Amount:
$228,829.00
Award Year:
1989
Program:
SBIR
Phase:
Phase II
Contract:
n/a
Award Id:
5198
Agency Tracking Number:
5198
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
45 Manning Rd, Billerica, MA, 01821
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
() -
Business Contact:
DR. STINESPRING
RESEARCHH SCIENTIST
() -
Research Institute:
n/a
Abstract
CLEAN SOURCES OF ATOMIC CHLORINE ARE REQUIRED FOR MECHANISTIC STUDIES OF SEMICONDUCTOR ETCHING PROCESSES. IN THIS PROPOSAL, AERODYNE RESEARCH, INC. DESCRIBES MODIFICATIONS TO AN EXISTING ULTRAHIGH VACUUM COMPATIBLE, EFFUSIVE BEAM, MICROWAVE DISCHARGE FLUORINE ATOM SOURCE WHICH WOULD ALLOW ITS USE AS A SOURCE OF CHLORINE ATOMS, AND THEY DEFINE MEASUREMENTS TO CHARACTERIZE AND DEMONSTRATE ITS OPERATION. THE MODIFICATIONS ARE AIMED PRIMARILY AT REDUCING HETEROGENEOUS RECOMBINATION OF CHLORINE ATOMS ON THE SOURCE WALLS. THE MEASUREMENT TECHNIQUES INCLUDE MODULATED BEAM MASS SPECTROMETRY AND X-RAY PHOTOELECTRON SPECTROSCOPY.

* information listed above is at the time of submission.

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