ATOMIC CHLORINE SOURCE FOR SEMICONDUCTOR ETCHING STUDIES

Award Information
Agency:
National Science Foundation
Amount:
$228,829.00
Program:
SBIR
Contract:
N/A
Solitcitation Year:
N/A
Solicitation Number:
N/A
Branch:
N/A
Award Year:
1989
Phase:
Phase II
Agency Tracking Number:
5198
Solicitation Topic Code:
N/A
Small Business Information
Aerodyne Research Inc.
45 Manning Rd, Billerica, MA, 01821
Hubzone Owned:
N
Woman Owned:
N
Socially and Economically Disadvantaged:
N
Duns:
N/A
Principal Investigator
 () -
Business Contact
 DR. STINESPRING
Title: RESEARCHH SCIENTIST
Phone: () -
Research Institution
N/A
Abstract
CLEAN SOURCES OF ATOMIC CHLORINE ARE REQUIRED FOR MECHANISTIC STUDIES OF SEMICONDUCTOR ETCHING PROCESSES. IN THIS PROPOSAL, AERODYNE RESEARCH, INC. DESCRIBES MODIFICATIONS TO AN EXISTING ULTRAHIGH VACUUM COMPATIBLE, EFFUSIVE BEAM, MICROWAVE DISCHARGE FLUORINE ATOM SOURCE WHICH WOULD ALLOW ITS USE AS A SOURCE OF CHLORINE ATOMS, AND THEY DEFINE MEASUREMENTS TO CHARACTERIZE AND DEMONSTRATE ITS OPERATION. THE MODIFICATIONS ARE AIMED PRIMARILY AT REDUCING HETEROGENEOUS RECOMBINATION OF CHLORINE ATOMS ON THE SOURCE WALLS. THE MEASUREMENT TECHNIQUES INCLUDE MODULATED BEAM MASS SPECTROMETRY AND X-RAY PHOTOELECTRON SPECTROSCOPY.

* information listed above is at the time of submission.

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