CMR Oxides Based Microbolometer Focal Plane Array with Reduced 1/f Noise
VP of Material Technologies
Robert C Dye
Los Alamos National Laboratory
PO Box 1663
Los Alamos, NM, 87545
Federally funded R&D center (FFRDC)
We propose to realize a new class of microbolometer FPA technology with significantly reduced 1/f noise by replacing the sensing material (e.g. VOx) with colossal magnetoresistive (CMR) oxides. The program uniquely combines Agiltron's experience in novel IR imager development and leading academic research on CMR at Los Alamos National Lab (LANL). The LANL Team has developed a breakthrough processing technique for CMR film deposition. Agiltron will further advance LANL's CMR film fabrication techniques to reduce maximum processing temperatures, allowing formation of microbolometers on top of CMOS circuitry as practiced in current technology. We anticipate reducing the NETD of state of the art bolometers from 29 mK to 12 mK. In Phase I, the feasibility of the proposed approach will be demonstrated through developing a CMOS compatible fabrication process of CMR oxides. Microbolometer modeling, design and fabrication will be also performed. Functional microbolometers based on CMR oxides and a performance comparison with state of the art devices can be expected at the end of the program.
* information listed above is at the time of submission.