Anvik Corporation

Company Information

Company Name
Anvik Corporation
Address
6 Skyline Dr.
Hawthorne, NY, 10532 0216
Phone
1 914-345-2442
URL
n/a
DUNS
796359289
Number of Employees
15
Minority Owned

Award Totals

PROGRAM/PHASE
AWARD AMOUNT ($)
NUMBER OF AWARDS
SBIR Phase I
$2,440,134.00
29
SBIR Phase II
$6,680,187.00
10
STTR Phase I
$297,718.00
3
Chart code to be here

Award List

  1. OPTICAL POLARIZATION BASED TAMPER-PROOF DRIVER'S LICENSE AND IDENTIFICATION CARDS

    Amount: $49,505.00

    THE USE OF FALSE DRIVER'S LICENSES AND OTHER IDENTIFICATION CARDS TO OBTAIN ALCOHOL BY UNDER- AGE DRIVERS AND BY REPEAT OFFENDERS WITH SUSPENDED LICENSES IS A SERIOUS PROBLEM. ACCIDENTS CAUSED BY SUCH ...

    SBIR Phase I 1992 Department of Transportation
  2. High-Speed, High-Resolution, Large-Area Exposure System for Printed Circuit Board Patterning

    Amount: $739,098.00

    In printed circuit board manufacturing, the patterning technology determines not only the ultimate packaging density, but also the economics of the entire process via throughput and yield. Conventiona ...

    SBIR Phase II 1996 Defense Advanced Research Projects AgencyDepartment of Defense
  3. Submicron-Resolution, Large-Area, High-Throughput Patterning System for Electronic Modules

    Amount: $750,000.00

    This proposal presents a program for developing a novel patterning system technology that not only delivers submicron resolution over a large image field, but also produces high exposure throughput an ...

    SBIR Phase II 1997 Missile Defense AgencyDepartment of Defense
  4. Large-Area High-Throughput Patterning System with Submicron Resolution

    Amount: $749,976.00

    In the fabrication of many electronic and opto-electronic products, such as multichip modules (MCMs), flat-panel displays (FPDs) and printed circuit boards (PCBs), it is necessary to fabricate million ...

    SBIR Phase II 1995 Air ForceDepartment of Defense
  5. Maskless Lithography System Based on Spatial Light Modulator Arrays

    Amount: $98,972.00

    This program addresses the problems associated with current microelectronic lithography systems which utilize masking technology. These problems include: the inability to generate prototype electron ...

    SBIR Phase I 1997 Defense Advanced Research Projects AgencyDepartment of Defense
  6. N/A

    Amount: $749,860.00

    N/A

    SBIR Phase II 1999 Defense Advanced Research Projects AgencyDepartment of Defense
  7. High-Output, Monodispersed Aerosol Particle Generation Using Microfabricated Nozzle Arrays

    Amount: $65,060.00

    Aerosol generation is an important leading edge technology with relevance to ballistic missile defense because of the importance of bioearosol generation technology in the development of countermeasur ...

    SBIR Phase I 1998 Missile Defense AgencyDepartment of Defense
  8. N/A

    Amount: $64,982.00

    N/A

    SBIR Phase I 2000 Missile Defense AgencyDepartment of Defense
  9. Massively Parallel Lithography System for Maskless Patterning of Printed Wiring Boards and Digitization of Artwork

    Amount: $69,984.00

    Not Available DSM is proposing the use of a novel high efficiency AMTEC (Alkali Metal Thermal to Electric Converter) as an increased efficiency power source for space missions and various ground appl ...

    SBIR Phase I 1999 ArmyDepartment of Defense
  10. Maskless Lithography System and Generation of High Density DNA Microarrays

    Amount: $730,000.00

    "Recent developments in DNA microarray generation technology have made entirely new methods of gene analysis feasible. The DNA microarray can greatly facilitate research in the areas of drug and vacc ...

    SBIR Phase II 2002 ArmyDepartment of Defense

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