Submicron-Resolution, Large-Area, High-Throughput Patterning System for Electronic Modules

Award Information
Agency:
Department of Defense
Branch
Missile Defense Agency
Amount:
$750,000.00
Award Year:
1997
Program:
SBIR
Phase:
Phase II
Contract:
n/a
Award Id:
28359
Agency Tracking Number:
28359
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
250 Clearbrook Rd, Elmsford, NY, 10523
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
Jeffrey Hoffman
(914) 345-2442
Business Contact:
() -
Research Institute:
n/a
Abstract
This proposal presents a program for developing a novel patterning system technology that not only delivers submicron resolution over a large image field, but also produces high exposure throughput and eliminates the shortcomings of conventional systems. The new technology is highly attractive in the fabrication of semiconductor integrated circuits and flat-panel displays. Phase I will design a system based on the new concept and demonstrate its conceptual feasibility.

* information listed above is at the time of submission.

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