Maskless Lithography System Based on Spatial Light Modulator Arrays

Award Information
Agency: Department of Defense
Branch: Defense Advanced Research Projects Agency
Contract: N/A
Agency Tracking Number: 36518
Amount: $98,972.00
Phase: Phase I
Program: SBIR
Awards Year: 1997
Solicitation Year: N/A
Solicitation Topic Code: N/A
Solicitation Number: N/A
Small Business Information
6 Skyline Drive, Hawthorne, NY, 10532
DUNS: N/A
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Thomas Dunn
 (914) 345-2442
Business Contact
Phone: () -
Research Institution
N/A
Abstract
This program addresses the problems associated with current microelectronic lithography systems which utilize masking technology. These problems include: the inability to generate prototype electronic modules quickly; the difficulties associated with generating large-area masks; and the dependence on foreign suppliers for mask substrates. The only available technology which does not require masks is direct-write imaging which suffers from an inherently slow speed due to its serial mode of addressing. In this proposal we present a program which eliminates all of the above shortcomings through the development of Anvik's maskless, large-area, high-throughput, high-resolution lithography system which combines a Spatial Light Modulator (SLM) with Anvik's patterning technology. The SLM acts as a programmable mask with high parallel-processing power which replaces the conventional mask. When used in conjunction with Anvik's seamless scanning technology, it can generate any possible pattern with high resolutionover an unlimited area. The proposed program will fill a critical need in the microelectronics manufacturing industry, and also significantly increase US competitiveness in an enabling technology area.

* Information listed above is at the time of submission. *

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