Maskless Lithography System and Generation of High Density DNA Microarrays

Award Information
Agency: Department of Defense
Branch: Army
Contract: DAMD17-01-C-0015
Agency Tracking Number: A002-2695
Amount: $730,000.00
Phase: Phase II
Program: SBIR
Awards Year: 2002
Solitcitation Year: N/A
Solitcitation Topic Code: N/A
Solitcitation Number: N/A
Small Business Information
Anvik Corp.
6 Skyline Drive, Hawthorne, NY, 10532
Duns: 796359289
Hubzone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Marc Zemel
 Product Manager
 (914) 345-2442
 mzemel@anvik.com
Business Contact
 Kanti Jain
Title: President
Phone: (914) 345-2442
Email: kjain@anvik.com
Research Institution
N/A
Abstract
"Recent developments in DNA microarray generation technology have made entirely new methods of gene analysis feasible. The DNA microarray can greatly facilitate research in the areas of drug and vaccine discovery, disease screening, and toxicology, amongothers. Therefore, the importance of a low-cost, high-resolution, high-throughput DNA microarray generation system cannot be understated. Current DNA microarray generation techniques suffer from severe limitations. The development of a new DNAmircoarray generation technique that has the high resolution of photolithography with the low cost of operation of mechanical deposition would significantly accelerate the pace of gene research. In this proposal, we present a method to generate DNAmicroarrays using a maskless lithography system. The maskless lithography system incorporates a large-array spatial light modulator to serve as a programmable mask. The spatial light modulator technology is integrated with Anvik's patented large arealithography technology to produce a breakthrough in lithography system development that allows rapid, high-density DNA microarray generation at low cost. In the Phase I program, we have developed the maskless lithography process specifically for DNAmicroarray generation. In the proposed Phase II program, we will construct a fully functional maskless lithography system and demonstrate the generation of DNA microarrays with an optimized process."

* information listed above is at the time of submission.

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