VERY-LARGE-AREA LITHOGRAPHY SYSTEM FOR FLEXIBLE DISPLAYS AND FLUIDIC-SELF-ASSEMBLY-BASED ELECTRONICS

Award Information
Agency:
National Science Foundation
Branch
n/a
Amount:
$99,995.00
Award Year:
2002
Program:
SBIR
Phase:
Phase I
Contract:
n/a
Award Id:
58543
Agency Tracking Number:
0214745
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
6 Skyline Drive, Hawthorne, NY, 10532
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
Marc Klosner
(914) 345-2442
mklosner@anvik.com
Business Contact:
() -
Research Institution:
n/a
Abstract
This Small Business Innovation Research (SBIR) Phase I project addresses the manufacturing of very-large-area flexible displays. It is critical to develop a low-cost manufacturing process that enables very-large-area flexible displays to be manufactured for the military as well as the consumer. Recent technical innovations in the area of very-large-area lithography and fluidic self-assembly offer a unique process for low-cost high-volume flexible display manufacturing. Anvik Corporation has developed a breakthrough lithography technology that enables high-throughput, cost-effective production of very large displays (20 to 120 inches diagonal) on flexible substrates, which may be either loaded as discrete sheets or fed continuously in a roll-to-roll configuration. Anvil's very-large-area lithography technology represents a significant breakthrough in display manufacturing. In this proposal, we present a program for developing a production-worthy lithography system for high-throughput, low-cost fabrication of flexible, high-resolution displays of sizes up to 60-inch diagonal. This lithography process are that it is compatible with fluidic self-assembly manufacturing techniques will potentially result in higher performance and lower cost displays.

* information listed above is at the time of submission.

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