VERY-LARGE-AREA LITHOGRAPHY SYSTEM FOR FLEXIBLE DISPLAYS AND FLUIDIC-SELF-ASSEMBLY-BASED ELECTRONICS

Award Information
Agency: National Science Foundation
Branch: N/A
Contract: N/A
Agency Tracking Number: 0214745
Amount: $99,995.00
Phase: Phase I
Program: SBIR
Awards Year: 2002
Solitcitation Year: N/A
Solitcitation Topic Code: N/A
Solitcitation Number: N/A
Small Business Information
Anvik Corporation
6 Skyline Drive, Hawthorne, NY, 10532
Duns: N/A
Hubzone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Marc Klosner
 (914) 345-2442
 mklosner@anvik.com
Business Contact
Phone: () -
Research Institution
N/A
Abstract
This Small Business Innovation Research (SBIR) Phase I project addresses the manufacturing of very-large-area flexible displays. It is critical to develop a low-cost manufacturing process that enables very-large-area flexible displays to be manufactured for the military as well as the consumer. Recent technical innovations in the area of very-large-area lithography and fluidic self-assembly offer a unique process for low-cost high-volume flexible display manufacturing. Anvik Corporation has developed a breakthrough lithography technology that enables high-throughput, cost-effective production of very large displays (20 to 120 inches diagonal) on flexible substrates, which may be either loaded as discrete sheets or fed continuously in a roll-to-roll configuration. Anvil's very-large-area lithography technology represents a significant breakthrough in display manufacturing. In this proposal, we present a program for developing a production-worthy lithography system for high-throughput, low-cost fabrication of flexible, high-resolution displays of sizes up to 60-inch diagonal. This lithography process are that it is compatible with fluidic self-assembly manufacturing techniques will potentially result in higher performance and lower cost displays.

* information listed above is at the time of submission.

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