High-Resolution, High-Efficiency, Curved Diffraction Gratings Fabricated by Conformable, Maskless,100-nm Lithography
National Aeronautics and Space Administration
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6 Skyline Dr, Hawthorne, NY, 10532-2165
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AbstractIn this program, we will develop a novel process for fabricating large-area ultraviolet diffraction gratings on curved surfaces. This process is based on a unique conformable maskless projection lithography system technology that has been developed by Anvik Corporation. The UV gratings that will be fabricated using this technology would be attractive for integration into imaging spectrometers, for example, for studying the solar corona and solar emissions, and their influence on the earth environment. In this program we will identify the patterning requirements for curved UV gratiings and we will demonstrate the feasibility of fabricating gratings using conformable maskless lithography. Anvik?s conformable maskless technology offers a number of advantages compared with currently available grating fabrication techniques, most significantly, it enables the patterning of sub-micron gratings on substrates having large sags.
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