High-Resolution, High-Efficiency, Curved Diffraction Gratings Fabricated by Conformable, Maskless,100-nm Lithography

Award Information
Agency: National Aeronautics and Space Administration
Branch: N/A
Contract: NNM04AA89C
Agency Tracking Number: 034206
Amount: $69,993.00
Phase: Phase I
Program: SBIR
Awards Year: 2004
Solicitation Year: 2003
Solicitation Topic Code: S1.06
Solicitation Number: N/A
Small Business Information
Anvik Corp
6 Skyline Dr, Hawthorne, NY, 10532-2165
DUNS: 796359289
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: Y
Principal Investigator
 Marc Klosner
 Principal Investigator
 (914) 345-2442
 mklosner@anvik.com
Business Contact
 Zachary Cosentino
Title: Business Official
Phone: (914) 345-2442
Email: zcosentino@anvik.com
Research Institution
N/A
Abstract
In this program, we will develop a novel process for fabricating large-area ultraviolet diffraction gratings on curved surfaces. This process is based on a unique conformable maskless projection lithography system technology that has been developed by Anvik Corporation. The UV gratings that will be fabricated using this technology would be attractive for integration into imaging spectrometers, for example, for studying the solar corona and solar emissions, and their influence on the earth environment. In this program we will identify the patterning requirements for curved UV gratiings and we will demonstrate the feasibility of fabricating gratings using conformable maskless lithography. Anvik?s conformable maskless technology offers a number of advantages compared with currently available grating fabrication techniques, most significantly, it enables the patterning of sub-micron gratings on substrates having large sags.

* information listed above is at the time of submission.

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