Conductive Ink for High Resolution 3-D Printing

Award Information
Agency: Department of Defense
Branch: Army
Contract: W31P4Q-09-C-0234
Agency Tracking Number: A082-035-0177
Amount: $69,997.00
Phase: Phase I
Program: SBIR
Awards Year: 2009
Solicitation Year: 2008
Solicitation Topic Code: A08-035
Solicitation Number: 2008.2
Small Business Information
Applied Nanotech, Inc.
3006 Longhorn Blvd., Suite 107, Austin, TX, 78758
DUNS: 013475129
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Jennifer Li
 Sr. Engineer
 (512) 339-5020
 jli@appliednanotech.net
Business Contact
 Nancy Ruel
Title: Contracts Manager
Phone: (512) 339-5020
Email: nruel@appliednanotech.net
Research Institution
N/A
Abstract
The Army is seeking a low-cost process for applying EMI grid patterns to the concave surface of a missile dome. Applied Nanotech, Inc. (ANI) is a leader in the development of metallic nano-inks for challenging application requirements; Optomec has developed a breakthrough multi-axis direct-write print head that generates an aerodynamically focused aerosol stream that can be used to print feature sizes down to 10 microns onto planar and non-planar substrates. ANI proposes to collaborate with Optomec in an SBIR program to develop a nano-scale conductive ink for high resolution 3-D printing with the aerosol jet technology. In Phase I, ANI and Optomec will conduct laboratory research and development culminating in a proof of concept demonstration of the grid application process by accurately printing the design pattern onto a flat surface of a substrate comprised of a candidate dome material and verifying a sheet resistance of the printed pattern of < 1 ohm per square.

* information listed above is at the time of submission.

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