Conductive Ink for High Resolution 3-D Printing

Award Information
Agency:
Department of Defense
Branch
Army
Amount:
$69,997.00
Award Year:
2009
Program:
SBIR
Phase:
Phase I
Contract:
W31P4Q-09-C-0234
Agency Tracking Number:
A082-035-0177
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
APPLIED NANOTECH, INC.
3006 Longhorn Blvd., Suite 107, Austin, TX, 78758
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
013475129
Principal Investigator:
Jennifer Li
Sr. Engineer
(512) 339-5020
jli@appliednanotech.net
Business Contact:
Nancy Ruel
Contracts Manager
(512) 339-5020
nruel@appliednanotech.net
Research Institution:
n/a
Abstract
The Army is seeking a low-cost process for applying EMI grid patterns to the concave surface of a missile dome. Applied Nanotech, Inc. (ANI) is a leader in the development of metallic nano-inks for challenging application requirements; Optomec has developed a breakthrough multi-axis direct-write print head that generates an aerodynamically focused aerosol stream that can be used to print feature sizes down to 10 microns onto planar and non-planar substrates. ANI proposes to collaborate with Optomec in an SBIR program to develop a nano-scale conductive ink for high resolution 3-D printing with the aerosol jet technology. In Phase I, ANI and Optomec will conduct laboratory research and development culminating in a proof of concept demonstration of the grid application process by accurately printing the design pattern onto a flat surface of a substrate comprised of a candidate dome material and verifying a sheet resistance of the printed pattern of < 1 ohm per square.

* information listed above is at the time of submission.

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