Standoff Detection of Nuclear Materials Using CNT-Based D2 Plasma Ion Source

Standoff Detection of Nuclear Materials Using CNT-Based D2 Plasma Ion Source

Award Information
Agency: Department of Defense
Branch: Defense Threat Reduction Agency
Contract: HDTRA1-09-P-0004
Agency Tracking Number: T082-004-0021
Amount: $99,997.00
Phase: Phase I
Program: SBIR
Awards Year: 2009
Solicitation Year: 2008
Solicitation Topic Code: DTRA082-004
Solicitation Number: 2008.2
Small Business Information
3006 Longhorn Blvd., Suite 107, Austin, TX, 78758
DUNS: 013475129
HUBZone Owned: N
Woman Owned: N
Socially and Economically Disadvantaged: N
Principal Investigator
 Richard Fink
 Vice President
 (512) 339-5020
 dfink@appliednanotech.net
Business Contact
 Nancy Ruel
Title: Contracts Manager
Phone: (512) 339-5020
Email: nruel@appliednanotech.net
Research Institution
N/A
Abstract
Applied Nanotech, Inc. (ANI) proposes to develop a novel neutron generator based on electron impact ionization from a carbon nanotube (CNT) electron source. Our proposed approach is aimed at providing significant advantages for man-portable or UAV deployment. It will provide significant advantages over existing neutron or gamma-ray sources in terms of size, weight and power efficiency without compromising yield. It will leverage existing RF-driven plasma source technologies thus lower the deployment time frame. Our proposed approach is based on extracting ions from a gas plasma and then accelerating these ions to a target (D or T target). The plasma is excited by electron current extracted from a carbon nanotube field emission cold cathode, thus eliminating the need for RF power generation and lowering the size and weight of the generator. The proposal team includes ANI, with a strong history of using CNT-based electron sources for display, lighting and gas ionization applications, Sandia NL, having the facilities needed to test the sources, and Dr. Ka-Ngo Leung, a leading expert in plasma-based neutron generators.

* Information listed above is at the time of submission. *

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