DIAMOND DEPOSITION ON NONPLANAR SUBSTRATES

Award Information
Agency:
Department of Defense
Amount:
$50,000.00
Program:
SBIR
Contract:
N/A
Solitcitation Year:
N/A
Solicitation Number:
N/A
Branch:
Air Force
Award Year:
1993
Phase:
Phase I
Agency Tracking Number:
20217
Solicitation Topic Code:
N/A
Small Business Information
Applied Science & Technology,
35 Cabot Road, Woburn, MA, 01801
Hubzone Owned:
N
Woman Owned:
N
Socially and Economically Disadvantaged:
N
Duns:
N/A
Principal Investigator
 Evelio Sevillano
 (617) 933-5560
Business Contact
Phone: () -
Research Institution
N/A
Abstract
The deposition of a thermally conductive, insulating film of diamond onto high power electronic devices is important for packaging applications for corrosive environments, or high power applications where coolants are used for thermal management. Deposition of diamond will require a basic understanding of plasma physics fundamentals governing interfaces between plasma and substrates, and intelligent application of low and high pressure plasma processes. The proposed work will be focused on diamond deposition on nonplanar surfaces using a novel plasma process consisting of low and high pressure steps, respectively, for diamond nucleation and growth. The effect of substrate topography on film uniformity and growth rate will be investigated. A low temperature, low pressure nucleation process will be combined with an existing low temperature growth process to identify physical mechanisms and limitations for diamond nucleation and growth on nonplanar substrates.

* information listed above is at the time of submission.

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