LARGE AREA, HIGH QUALITY, ELECTRON CYCLOTRON RESONANCE, CHEMICAL VAPOR DISPOSITION SIC THIN FILMS FOR ASTRONOMICAL MIRRORS

Award Information
Agency:
National Science Foundation
Branch
n/a
Amount:
$50,000.00
Award Year:
1993
Program:
SBIR
Phase:
Phase I
Contract:
n/a
Award Id:
21604
Agency Tracking Number:
21604
Solicitation Year:
n/a
Solicitation Topic Code:
n/a
Solicitation Number:
n/a
Small Business Information
35 Cabot Rd, Woburn, MA, 01801
Hubzone Owned:
N
Minority Owned:
N
Woman Owned:
N
Duns:
n/a
Principal Investigator:
Lawrence P Bourget
(617) 933-5560
Business Contact:
() -
Research Institution:
n/a
Abstract
SILICON CARBIDE IS A LEADING NEW CANDIDATE FOR MIRROR BLANKS BECAUSE OF ITS HIGH STIFFNESS, RELATIVELY HIGH THERMAL CONDUCTIVITY, AND ABRASION RESISTANCE. THE BASE MATERIAL CONTAINS PORES OR LARGE GRAINS, WHICH MAKE IT DIFFICULT TO PROVIDE A SMOOTH FRONT SURFACE. RESEARCHERS HAVE DEVELOPED A PROCESS FOR USING ECR CHEMICAL VAPOR DEPOSITION TO DEPOSIT VERY SMOOTH AMORPHOUS SILICON CARBIDE (SIC) ON 100 MM SUBSTRATES. THE MATERIAL IS EASILY POLISHED TO OBTAIN A 10-20 A RMS SURFACE ROUGHNESS. RESEARCHERS ARE SCALING UP THIS PROCESS TO COAT LARGE DIAMETER OPTICS. THE MAIN PROBLEMS ASSOCIATED WITH SCALE-UP INVOLVE PLASMA GAS DYNAMICS AND FLUID FLOWS. RESEARCHERS ARE DEVELOPING A GENERAL COMPUTATIONAL MODEL TO BE USED FOR DESIGNING THE GAS DELIVERY SYSTEM. AN EXISTING SYSTEM TO COAT LARGE-AREA OPTICS WITH SMOOTH, AMORPHOUS SIC IS BEING MODIFIED.

* information listed above is at the time of submission.

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